2012 13th International Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems 2012
DOI: 10.1109/esime.2012.6191798
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Numerical and experimental results correlation during power MOSFET ageing

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Cited by 7 publications
(3 citation statements)
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“…Bond failure is mainly caused by any crack growth at the bond wire/chip interface due to the difference of CTEs of Si and Al [12]. R DS(ON) of a MOSFET increases due to the degradation at metallization and at the contact area of bonding wire metallization [13]. The authors in [14] also concluded that R DS(ON) increases due to thermal aging, and intermetallic growth and Kirkendall voids formation at the bond-pad interface at higher temperature were studied in this paper.…”
Section: Origin Of Degradation In Power Semiconductor Devicesmentioning
confidence: 99%
“…Bond failure is mainly caused by any crack growth at the bond wire/chip interface due to the difference of CTEs of Si and Al [12]. R DS(ON) of a MOSFET increases due to the degradation at metallization and at the contact area of bonding wire metallization [13]. The authors in [14] also concluded that R DS(ON) increases due to thermal aging, and intermetallic growth and Kirkendall voids formation at the bond-pad interface at higher temperature were studied in this paper.…”
Section: Origin Of Degradation In Power Semiconductor Devicesmentioning
confidence: 99%
“…Bond wire lift-off can be electrically detected by measuring the collector-emitter saturation voltage (V CE,sat ) of IGBT [9]- [11], and this failure can be detected from any 5% increment in V CE,sat [12]. R DS increases due to the degradation at metallization and at the contact area of bonding wire metallization [13]. Reference [14] also concluded that R DS increases due to thermal aging.…”
Section: State Of the Art Solution To Identify Device Degradationmentioning
confidence: 99%
“…Degradation at the contact area of bonding wire -metallization is reflected in the MOSFET ON -stare resistance (R DS ). R DS increases due to the degradation at metallization and at the contact area of bonding wire -metallization [7]. Reference [8] also concluded that R DS increases due to thermal aging of MOSFET.…”
Section: Aging Factors and State Of The Art Solutionsmentioning
confidence: 99%