2016
DOI: 10.1063/1.4952720
|View full text |Cite
|
Sign up to set email alerts
|

Numerical evaluation of Auger recombination coefficients in relaxed and strained germanium

Abstract: The potential applications of germanium and its alloys in infrared silicon-based photonics have led to a renewed interest in their optical properties. In this letter, we report on the numerical determination of Auger coefficients at T = 300 K for relaxed and biaxially strained germanium. We use a Green's function based model that takes into account all relevant direct and phonon-assisted processes and perform calculations up to a strain level corresponding to the transition from indirect to direct energy gap. … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

2
12
0

Year Published

2017
2017
2023
2023

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 17 publications
(14 citation statements)
references
References 23 publications
2
12
0
Order By: Relevance
“…Hereby, we provide experimental data that complement and enhance numerical simulation techniques. 20,21 As a result, we underline the dominating influence of SRH processes over Auger recombination in heavily doped Ge epilayers even in the limit of large Auger coefficients as reported in the literature. 19,20 Highly n-doped Ge/Si(001) films, featuring different phosphorous donor concentrations in the 1 Â 10 19 cm À3 range and a film thickness of approximately 800 nm, were grown by reduced pressure chemical vapor deposition 22 on 8-inch Si wafers.…”
supporting
confidence: 74%
See 1 more Smart Citation
“…Hereby, we provide experimental data that complement and enhance numerical simulation techniques. 20,21 As a result, we underline the dominating influence of SRH processes over Auger recombination in heavily doped Ge epilayers even in the limit of large Auger coefficients as reported in the literature. 19,20 Highly n-doped Ge/Si(001) films, featuring different phosphorous donor concentrations in the 1 Â 10 19 cm À3 range and a film thickness of approximately 800 nm, were grown by reduced pressure chemical vapor deposition 22 on 8-inch Si wafers.…”
supporting
confidence: 74%
“…While it is generally accepted that Auger recombination is the dominant mechanism in moderately doped Ge (<1 Â 10 18 cm À3 ), 16,17 its relative contribution to the total nonradiative recombination rate in the limit of high-or even ultrahigh donor densities is still in debate. [18][19][20] In fact, recent studies suggest that high doping triggers a drastic reduction of the Shockley-Read-Hall (SRH) nonradiative recombination time s SRH in Ge/Si heterostructures, making this mechanism the one responsible for a reduced excess carrier density and, consequently, for an overall decrease in the photon emission rate. [21][22][23] Nevertheless, other studies concluded that the presence of dopants in epitaxial Ge on Si has a negligible effect only on s SRH .…”
mentioning
confidence: 99%
“…This coefficient is rather independent of material (typically 10 −32 -10 −30 cm 6 /s and it is in the order of 10 −31 for indirect transition in Si and Ge and GaAs [32][33][34][35]. We want to estimate the Auger effect using an approximate model that is material independent, and we therefore set C a = 10 −31 cm 6 /s for all considered materials.…”
Section: Resultsmentioning
confidence: 99%
“…Ca is the total ambipolar Auger coefficient, which is rather independent of material (typically 10 -32 -10 -30 cm 6 /s and it is in the order of 10 -31 for indirect transition in Si and Ge and GaAs [76][77][78][79]. We want to estimate the Auger effect using an approximate model that is material independent, and we therefore set Ca = 10 -31 cm 6 /s for all considered materials.…”
Section: Modelling the Maximum Efficiencymentioning
confidence: 99%