Numerical Modeling of the Droplet Vaporization for Design and Operation of Liquid‐pulsed CVD

Abstract

The original article presented the modeling for nonsteady evaporation processes of liquid solution droplets injected into a pumped-down low-pressure vessel having a specified wall temperature. Numerical simulations were carried out for one of the few precursors with sufficient physical property data, TTIP. The authors compared the droplet evaporation processes for two possible solvents, toluene and hexane. Unfortunately, a discrepancy in the unit systems of the property references (molar units vs mass units) was not detected during the modeling used in this paper. We present here the correct property values, the corrected figures and updated discussion. The sensitivity analysis and stages of the vaporization process elicited in the simulations are not affected by this error. Updated Figures 5, 6, 7, 10 and 11 showing corrected droplet evaporation times for a process, normalized to 10 s cycles, are given here.The ). In consequence, the vaporization times for TTIP and toluene mixtures were underestimated. The vaporization time of a mixture of TTIP and hexane is 3.81 s (instead of 2.35 s). The

Sub-monolayer Au9cluster formationviapulsed nozzle cluster deposition

“…S4 †) may be accounted for by vacuum degradation over lengthy depositions affecting the solvent evaporation rate. Alternatively, in some pulsed CVD modelling 20,34 it has been proposed that particles can aggregate in a vacuum as the solvent droplets containing the particles evaporate and contract, clumping solvated contents into more concentrated groups. [Note: the Mathematica code used for this modelling can be found in Fig.…”