Numerical study of the DLC film flow field in the ECR-PECVD reaction chamber

Abstract

This paper mainly investigates the optimum parameters for the fabrication of uniform diamond-like carbon (DLC) films on the electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD) reaction chamber by analyzing the effect of the reacting gas velocity on the film properties. This work makes use of computational fluid dynamics (CFD) approach to model surface chemical reactions, flow and temperature fields, as well as heat and mass transfer phenomena. The simulation has shown that natural convection and mass transfer affect the recirculating flow within the reactor and, therefore, the distribution of material deposition. In other words, as a result of attaching an endplate (baffle) at the top of the substrate, the deposition rate of the substrate is appreciably enhanced. However, the surface uniformity of the substrate is obviously deteriorated.

Ferris-wheel-assisted parylene-C dielectric deposition for improving organic thin-film transistor uniformity

“…However, the thickness of deposited films is sensitive to the locations of samples in a vacuum chamber, since it is difficult to make the distribution of parylene monomer identical everywhere in the chamber. To mitigate this effect, baffles have been used and designed with the numerical simulation of monomer distribution for parylene coaters to control the gas flowing behavior, as well as other vacuum deposition systems [24][25][26]. Besides baffle designs, most parylene-C coaters are designed with a one-dimensional (1D) rotation system for samples to move around the chamber in horizontal planes during deposition (figure 1(a)) [27].…”