Oblique angle deposition and its applications in plasmonics

He, Yizhuo; Fu, Junxue; Zhao, Yiping

doi:10.1007/s11467-013-0357-1

Cited by 68 publications

(50 citation statements)

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“…The CdO thin film deposition by oblique angle (θ° = 017), has larger clusters and becomes rougher. This result is in good agreement with those in literature [0][1][2][3][4][5][6][7][8][9]. This may be due to in columnar structure of films produce by oblique deposition technique accompanied by self shadowing effect and film thickness [08].…”

Section: B) Atomic Force Microscopesupporting

confidence: 91%

“…By this technique it has been possible to produce zigzags [4], pillars [0], chevrons [2], spirals [0] and other film microstructures from various materials including metals, insulators and semiconductors [6]. Potential applications include optical polarizers, high birefringence biaxial films, thin-film wave plates, optical humidity sensors, magnetic storage media, nanoemitters, and actuators.…”

Section: Introductionmentioning

confidence: 99%

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Preparation and Characterization of CdO Thin Films Obtained by Oxidation of Obliquely Evaporated Cd Thin Films

Khalef¹

2017

JNUS

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In this work, oblique angle deposition technique (OAD) was used to grow cadmium thin films onto glass substrates at different angles (1º and 01º), and then oxidized in air at (011 °C) for 0 hour by conventional furnace as the oxidation source. The effect of deposition angle on the structural, morphology, optical and electrical properties of cadmium oxide thin film were studied. XRD technique used to study the crystalline structure of these films confirm the polycrystalline nature of these films and the higher intensity accompanied that deposited with (01˚) with preferred orientation (000). Some structural parameters such as grain size was calculated. The surface morphology shows an improvement with higher incident angle. The optical properties shows that the transmition decreasing with increases deposition angle and the optical energy gap (Eg) values are (4.2 and 4.9) eV for normal and oblique deposition respectively. The dark current increases linearity with applied voltage and deceases with increasing deposition angle at the fixed applied voltage (ohmic behavior) with activation energy found to be (1.0022 -1.0040) ( eV) for normal and oblique deposition respectively .

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Section: B) Atomic Force Microscopesupporting

confidence: 91%

Section: Introductionmentioning

confidence: 99%

Preparation and Characterization of CdO Thin Films Obtained by Oxidation of Obliquely Evaporated Cd Thin Films

Khalef¹

2017

JNUS

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“…This phenomenon is called surface plasmon resonance (SPR), or in the case of nanometric metallic structures, localized surface plasmon resonance (LSPR). OAD has been utilized by many authors for the controlled fabrication of metallic structures intended for plasmonics applications; a topic that has recently been reviewed by He et al [520] and Abdulhalim [521]. The OAD technique presents some competitive advantages with respect to many other fabrication techniques for metallic supported nanostructures (e.g., self-assembly, electron beam lithography, nanosphere lithography, etc.…”

Section: Plasmonics and Plasmonic-related Applicationsmentioning

confidence: 99%

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Barranco

Borrás

González‐Elipe

et al. 2016

Progress in Materials Science

618

436

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a b s t r a c tThe oblique angle configuration has emerged as an invaluable tool for the deposition of nanostructured thin films. This review develops an up to date description of its principles, including the atomistic mechanisms governing film growth and nanostructuration possibilities, as well as a comprehensive description of the applications benefiting from its incorporation in actual devices. In contrast with other reviews on the subject, the electron beam assisted evaporation technique is analyzed along with other methods operating at oblique angles, including, among others, magnetron sputtering and pulsed laser or ion beam-assisted deposition techniques. To account for the existing differences between deposition in vacuum or in the presence of a plasma, mechanistic simulations are critically revised, discussing well-established paradigms such as the tangent or cosine rules, and proposing new models that explain the growth of tilted porous nanostructures. In the second part, we present an extensive description of applications wherein oblique-angle-deposited thin films are of relevance. From there, we proceed by considering the requirements of a large number of functional devices in which these films are currently being utilized (e.g., solar cells, Li batteries, electrochromic glasses, biomaterials, sensors, etc.), and subsequently describe how and why these nanostructured materials meet with these needs.

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“…As validation, experiments of physical vapor deposition and the generalized theory agree in terms of the diameter as a function of the separation of nanorods. The diameter of metallic nanorods from physical vapor deposition (PVD) is a critical quantity that defines their functionalities, such as mechanical strength [1][2][3] and sensitivity in surface enhanced Raman spectroscopy [4][5][6]. Conventional PVD processes typically lead to the growth of thin films [7,8].…”

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confidence: 99%

Generalized theory of smallest diameter of metallic nanorods

Elliott

Huang

2017

Phys. Rev. Materials

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This Letter reports a generalized theory of the smallest diameter of metallic nanorods from physical vapor deposition. The generalization incorporates the effects of nanorod separation and those of van der Waals interactions on geometrical shadowing. In contrast, the previous theory for idealized geometrical shadowing [Phys. Rev. Lett. 110, 136102 (2013)] does not include any dependence on nanorod separation and it predicts the diameter to be about 1/2 to 1/3 of what the generalized theory does. As verification, numerical solutions and the generalized theory in closed-form agree in terms of effective deposition flux. As validation, experiments of physical vapor deposition and the generalized theory agree in terms of the diameter as a function of the separation of nanorods. The diameter of metallic nanorods from physical vapor deposition (PVD) is a critical quantity that defines their functionalities, such as mechanical strength [1][2][3] and sensitivity in surface enhanced Raman spectroscopy [4][5][6]. Conventional PVD processes typically lead to the growth of thin films [7,8]. Under glancing angle deposition (GLAD), PVD processes result in the growth of nanorods [9,10]. As atoms arrive on a substrate with a glancing angle that is close to 90 o , they land at peaks and avoid valleys due to geometrical shadowing effects. As an effect of positive feedback, the peaks grow into nanorods due to geometrical shadowing. In the processes of nanorod growth, multiple-layer surface steps form and impose three-dimensional (3D) Ehrlich-Schwoebel (ES) barriers [11,12] that are larger than the conventional ES barriers from monolayer surface steps [13,14].The diameter of nanorods is the smallest when the 3D ES barriers dominate or equivalently when multiple-layer surface steps bound the top of nanorods [15] under a given geometrical shadowing condition. The geometrical shadowing goes to complete or ideal as the incidence angle approaches 90 o . Under this idealized condition, all atoms will be deposited on the top surface of nanorods with none reaching their side surfaces, independent of nanorod separation. For such idealized geometrical shadowing, we recently reported a closed-form theory of the smallest diameter [15].Going beyond the idealized shadowing condition, we here report a generalized theory, in closed-form, with non-ideal shadowing conditions and with the effects of van der Waals (vdW) interactions. Figure 1 schematically illustrates the generalization of a nanorod growth process. The direct deposition on the top results in a diameter of the core (orange in the figure), which is governed by our previous theory [15]. The deposition on the sides gives the thickness of the shell (tan in Fig. 1), and it depends on the separation of nanorods. Further, due to vdW interactions, the atomic flux on the 1 Author to whom correspondence should be addressed; electronic mail: h.huang@northeastern.edu top is greater than on the side of nanorods, as indicated by the denser flux lines in Fig. 1. FIG. 1. Schematic of nanorod growth,...

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Oblique angle deposition and its applications in plasmonics

Cited by 68 publications

References 84 publications

Preparation and Characterization of CdO Thin Films Obtained by Oxidation of Obliquely Evaporated Cd Thin Films

Preparation and Characterization of CdO Thin Films Obtained by Oxidation of Obliquely Evaporated Cd Thin Films

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Generalized theory of smallest diameter of metallic nanorods

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