2007
DOI: 10.1063/1.2813617
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Observation of electric-field induced Ni filament channels in polycrystalline NiOx film

Abstract: For high density of resistive random access memory applications using NiOx films, understanding of the filament formation mechanism that occurred during the application of electric fields is required. We show the structural changes of polycrystalline NiOx (x=1–1.5) film in the set (low resistance), reset (high resistance), and switching failed (irreversible low resistance) states investigated by simultaneous high-resolution transmission electron microscopy and electron energy-loss spectroscopy. We have found t… Show more

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Cited by 234 publications
(166 citation statements)
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“…2c reached B1 Â 10 5 A cm À 2 . This current density is large enough to induce a thermally assisted electromigration 30,31 of oxygen vacancies into the insulating tantalum oxide clusters caused by the accompanying Joule heating effect 32,33 at the Pt/SiO 2 interface. This result suggests the possibility that the filamentary channels consisting of the metastable phase TaO 1 À x (ref.…”
Section: Resultsmentioning
confidence: 99%
“…2c reached B1 Â 10 5 A cm À 2 . This current density is large enough to induce a thermally assisted electromigration 30,31 of oxygen vacancies into the insulating tantalum oxide clusters caused by the accompanying Joule heating effect 32,33 at the Pt/SiO 2 interface. This result suggests the possibility that the filamentary channels consisting of the metastable phase TaO 1 À x (ref.…”
Section: Resultsmentioning
confidence: 99%
“…Most of the existing theories of RS phenomenon are widely based on dynamic percolation model, e.g. forming and rupturing of conduction filaments [4][5][6][7] or on the migration of oxygen vacancies. [8][9][10] Recently, a new mechanism of RS based on self-trapped electrons and holes has been proposed.…”
mentioning
confidence: 99%
“…22 The resistivity around the grain boundary is expected to be low, and this was experimentally confirmed by means of in-situ TEM. 42 Formation of conductive filaments and further ReRAM switching would preferentially occur around the grain boundaries.…”
Section: A Forming Power and The Bridge Sizementioning
confidence: 88%
“…There have been some attempts to observe and analyze the filaments. [22][23][24][25] They were mainly ex-situ experiments after the resistive switching, and exploration of the tiny filaments seems hard because the filament formation occurs randomly in the device area. 24 More direct information about the filaments can be accumulated by dynamically observing the switching processes.…”
Section: Introductionmentioning
confidence: 99%