“…There are also depositing methods: laser ablation, depositing with ions fascicle, plating with jet of ion plasma, the plasma atomization and the blitz evaporation, but with certain inherent problems such as the lack of uniformity of the layer thickness and the composition's lack of uniformity, low coating speed, or low handling and incompatibility with the process performed by MEMS, etc. The depositing processes through laser ablation surpass the majority of these problems [11][12][13][14]. The transformation temperatures, behavior of shape memory, and the super-elasticity of the pulverized layers of Ni-Ti are sensitive at the most metallurgical factors (the alloy composition, contamination, thermic-mechanical treatments of re-annealing and ageing), at the atomization conditions (co-atomization with multi-aims, the target, the gas pressure, the distance from the target to the sub-layer, the depositing temperature, obliquity sub-layer, etc.…”