On certain aspects of the THERMOS toolkit for modeling experiments

Vichev, Ilia Yurievich; Solomyannaya, Anna Dmitrievna; Grushin, A. S.; Kim, Dmitrii Andreevich

doi:10.1016/j.hedp.2019.100713

Cited by 23 publications

(4 citation statements)

References 15 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…A one-temperature one-fluid model of a quasi-neutral plasma was used. The local ionization multiplicity was determined from the stationary distribution obtained in the framework of collisional-radiative equilibrium using the THERMOS code [28]. This approximation works well on the considered scale of characteristic times (∼nanoseconds) and laser intensities (10 12 -10 13 W cm −2 ) since electrons and ions have enough time to come into equilibrium and detailed consideration of the ionization kinetics is not required.…”

Section: Hydrodynamic Simulationmentioning

confidence: 99%

Laser-accelerated MeV-scale collimated electron bunch from a near-critical plasma of a liquid jet target

Ivanov,

Shulyapov,

Gorlova

et al. 2024

Laser Phys. Lett.

View full text Add to dashboard Cite

Generation of a collimated electron bunch with energy of a few MeV is demonstrated experimentally during propagation of 1 TW 10 Hz femtosecond laser radiation through a near-critical plasma formed from a micrometer-scale liquid jet (ethanol) target by ablation and boring with an intense nanosecond pulse. Hydrodynamic and particle-in-cell simulations reveal the evolution of the plasma cloud and help to identify the acceleration mechanism, which is related to self-modulated laser Wakefield acceleration during nonlinear propagation of laser radiation through plasma. The measured bunch divergence is at the level of 0.04 rad with high shot-to-shot stability. The total charge of the particles with energy above 1.6 MeV was estimated at ∼15 pC. The simplicity and robustness of the target design allows for enhanced pulse repetition rate with suppressed debris formation.

show abstract

Section: Hydrodynamic Simulationmentioning

confidence: 99%

Laser-accelerated MeV-scale collimated electron bunch from a near-critical plasma of a liquid jet target

Ivanov,

Shulyapov,

Gorlova

et al. 2024

Laser Phys. Lett.

View full text Add to dashboard Cite

show abstract

“…其中, E Z 表示Z价离子的电离能, ξ z 表示Z价离子最外层电子数. 考虑等离子体密度带来的电离能降低效应, 采用 Debye-Hückel 模型 [29] 对电离能修正, 得到不同温度、密度下锡等离子体内各价态离子分布以及平均电离度如图2和图3所示.…”

Section: 全局状态方程模型unclassified

Simulation of extreme ultraviolet radiation of laser induced discharge plasma

Wang,

Xuan,

et al. 2024

Acta Phys. Sin.

View full text Add to dashboard Cite

Laser induced discharge plasma is one of the important technical means for extreme ultraviolet light source. In this paper, a radiation magneto-hydrodynamic model based on a global equation of state model, an atomic structure calculation model and a collision radiation model is proposed to simulate the dynamic characteristics of laser induced discharge plasma and its extreme ultraviolet radiation characteristics. The simulation reproduced the pinch phenomenon during the discharge process, and the conversion efficiency of extreme ultraviolet light obtained was consistent with the experiment result.

show abstract

“…[12][13][14] In brief, the code solves the single-fluid, single-temperature hydrodynamic equations incorporating radiation transfer and thermal conduction processes. 15 Spectral absorption coefficients and equation-of-state parameters are derived from the THERMOS code 16,17 and the Frankfurt equation-of-state (FEOS) model, 18 respectively. Laser light absorption and reflection are treated using a hybrid model combining a geometrical-optics ray-tracing approach in low-density plasma regions and a wave-optics approach in regions near and beyond the critical electron density.…”

Section: Simulations With Ralef-2dmentioning

confidence: 99%

Tin fluid dynamics driven by laser-produced plasmas relevant to EUV nanolithography

Hemminga

Poirier

Hernández-Rueda

et al. 2023

Optical and EUV Nanolithography XXXVI

View full text Add to dashboard Cite

State-of-the-art nanolithography machines employ extreme ultraviolet (EUV) light to pattern nanometer-scale features on silicon wafers for the production of integrated circuits. This radiation is generated in a laserproduced plasma formed on tin microdroplet targets. In this contribution, we give an overview of our recent experimental and theoretical studies on the properties of tin plasmas driven by short-wavelength lasers and the subsequent tin fluid dynamics. First, we will present a comprehensive characterization of the properties of laserproduced tin plasmas driven by lasers with wavelengths in the 1–10 µm range. Second, we present absolutely calibrated, charge-state-resolved measurements of the ion kinetic energy distribution recorded under multiple detection angles. Through extensive radiation-hydrodynamic simulations of the plasma formation, growth and expansion, we demonstrate that a single-fluid approach accurately reproduces the angular dependence of the ion energy distribution. Moreover, we identify the origin of a high-energy peak in the distribution as a high-speed shell generated at early times in the expansion. Finally, we show that the time evolution of the droplet target morphology is entirely determined by the early-time plasma-driven pressure impulse on the droplet.

show abstract

On certain aspects of the THERMOS toolkit for modeling experiments

Cited by 23 publications

References 15 publications

Laser-accelerated MeV-scale collimated electron bunch from a near-critical plasma of a liquid jet target

Laser-accelerated MeV-scale collimated electron bunch from a near-critical plasma of a liquid jet target

Simulation of extreme ultraviolet radiation of laser induced discharge plasma

Tin fluid dynamics driven by laser-produced plasmas relevant to EUV nanolithography

Contact Info

Product

Resources

About