On-Chip Detection of Radiation Guided by Dielectric-Loaded Plasmonic Waveguides

Han, Zhanghua; Radko, Ilya P.; Mazurski, Noa; Desiatov, Boris; Beermann, Jonas; Albrektsen, Ole; Levy, Uriel; Bozhevolnyi, Sergey I.

doi:10.1021/nl5037885

Cited by 23 publications

(12 citation statements)

References 28 publications

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“…[ 126 ] To implement it, a nanoscale slit was placed beneath the DLSPP waveguide in the gold fi lm, while the whole structure was fabricated on a Si substrate. When the DLSPPW mode reaches the slit, [ 126 ] Copyright 2014, American Chemical Society.…”

Section: Reviewmentioning

confidence: 99%

Active Nanophotonic Circuitry Based on Dielectric‐loaded Plasmonic Waveguides

Krasavin

Zayats

2015

Advanced Optical Materials

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Surface plasmon polaritons provide a unique opportunity to localize and guide optical signals on deeply subwavelength scales and can be used as a prospective information carrier in highly integrated photonic circuits. Dielectric‐loaded surface plasmon polariton waveguides present a particular interest for applications offering a unique platform for the realization of integrated active functionalities. This includes active control of plasmonic propagation using thermo‐optic, electro‐optic, and all‐optical switching as well as compensation of propagation losses. In this review, the principles and performance of such waveguides are discussed and the current status of the related active plasmonic components which can be integrated in silicon or other nanophotonic circuitries is summarized. A comparison of dielectric‐loaded and other plasmonic waveguides is presented and various material platforms and design pathways are discussed.

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Section: Reviewmentioning

confidence: 99%

Active Nanophotonic Circuitry Based on Dielectric‐loaded Plasmonic Waveguides

Krasavin

Zayats

2015

Advanced Optical Materials

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“…One of the unique features of the all-plasmonic MZM approach that sets it apart from previous devices is the fact that the whole device can be fabricated by only depositing a metal onto an oxide substrate and spin-coating a nonlinear material, because the silicon access waveguides can be replaced, for example, by metallic antennas or gratings to couple the light in and out 27,28 . This makes the approach universally applicable in CMOS foundries and is likely to allow seamless co-integration with electronics.…”

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confidence: 99%

All-plasmonic Mach–Zehnder modulator enabling optical high-speed communication at the microscale

et al. 2015

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Optical modulators encode electrical signals to the optical domain and thus constitute a key element in high-capacity communication links 1,2 . Ideally, they should feature operation at the highest speed with the least power consumption on the smallest footprint, and at low cost 3 . Unfortunately, current technologies fall short of these criteria 4 . Recently, plasmonics has emerged as a solution offering compact and fast devices 5-7 . Yet, practical implementations have turned out to be rather elusive.Here, we introduce a 70 GHz all-plasmonic Mach-Zehnder modulator that fits into a silicon waveguide of 10 μm length. This dramatic reduction in size by more than two orders of magnitude compared with photonic Mach-Zehnder modulators results in a low energy consumption of 25 fJ per bit up to the highest speeds. The technology suggests a cheap co-integration with electronics.Mach-Zehnder modulators (MZMs) are the most versatile electro-optical converters in high-end communication systems. MZMs are unique, as they can be used to encode multiple bits within one symbol with the highest quality. They are thus instrumental in increasing the capacity of modern communication links 1 . Until now, MZMs have mostly been based on the lithium niobate material system, which requires footprints on the order of cm 2 . Recently, more compact silicon-based modulators have emerged. These devices have already shown operation at bandwidths up to 55 GHz (ref. 8), they are cost-effective, and they feature lengths on the order of hundreds of micrometres to millimetres 2,3,8-12 . Yet, complementary metal-oxide semiconductor electronics (CMOS) house hundreds of transistors on a single μm 2 , making a co-integration of today's silicon MZMs with CMOS electronics impractical 4 . In pursuit of more compact silicon modulators, various approaches have been demonstrated, such as resonant silicon ring modulators 13,14 or germanium-based electro-absorption modulators 15,16 . However, encoding advanced modulation formats is challenging 17 , and high-capacity transmission has, so far, only been achieved with MZMs 2,12 . Instead, plasmonics has drawn significant interest as an alternative solution 6,7 . In plasmonics, optical signals are converted to surface plasmon polaritons (SPPs) propagating at metal-dielectric interfaces, where they can be confined below the diffraction limit of optics 18 . This means that plasmonic devices require only a few µm 2 of footprint 19,20 . With such reduced dimensions, the technology is much closer to bridging the size gap with respect to CMOS electronics. Furthermore, there are various theoretical studies indicating that plasmonic MZMs should offer hundreds of gigahertz of bandwidth 5,21 . To date, however, there is very little experimental evidence to support this claim. Recently, a plasmonic phase modulator demonstrated operation at 40 Gbit s −1 (ref. 22). One could now envision integrating such plasmonic phase modulators into a silicon waveguide MZM configuration. However, by combining plasmonics and silicon photoni...

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“…Plasmonic waveguides (PWGs) [ 1 ], which can confine and guide light at the subwavelength scale, are one of the components necessary to realize ultra-high-density photonic integration [ 2 ]. The traditional noble metallic PWGs, such as metal stripe/nanowire waveguides [ 3 , 4 , 5 ], channel/wedge plasmon waveguides [ 6 ], gap plasmon waveguides [ 7 , 8 , 9 ], dielectric-loaded plasmon waveguides [ 10 , 11 , 12 ], and hybrid PWGs [ 1 , 13 , 14 , 15 , 16 , 17 , 18 ], have been intensively studied in the near-infrared and visible bands. However, in the mid- and far-infrared bands, the plasmonic effects of metals (which were modeled as perfect electric conductors) are very weak and the electromagnetic optical response cannot be dynamically adjusted, which imposes restrictions on their applications at the nanoscale [ 19 , 20 ].…”

Section: Introductionmentioning

confidence: 99%

Symmetric Graphene Dielectric Nanowaveguides as Ultra-Compact Photonic Structures

Teng

Wang

et al. 2021

Nanomaterials

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A symmetric graphene plasmon waveguide (SGPWG) is proposed here to achieve excellent subwavelength waveguiding performance of mid-infrared waves. The modal properties of the fundamental graphene plasmon mode are investigated by use of the finite element method. Due to the naturally rounded tips, the plasmon mode in SGPWG could achieve a normalized mode field area of ~10−5 (or less) and a figure of merit over 400 by tuning the key geometric structure parameters and the chemical potential of graphene. In addition, results show that the modal performance of SGPWG seems to improve over its circular counterparts. Besides the modal properties, crosstalk analysis indicates that the proposed waveguide exhibits extremely low crosstalk, even at a separation distance of 64 nm. Due to these excellent characteristics, the proposed waveguide has promising applications in ultra-compact integrated photonic components and other intriguing nanoscale devices.

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On-Chip Detection of Radiation Guided by Dielectric-Loaded Plasmonic Waveguides

Cited by 23 publications

References 28 publications

Active Nanophotonic Circuitry Based on Dielectric‐loaded Plasmonic Waveguides

Active Nanophotonic Circuitry Based on Dielectric‐loaded Plasmonic Waveguides

All-plasmonic Mach–Zehnder modulator enabling optical high-speed communication at the microscale

Symmetric Graphene Dielectric Nanowaveguides as Ultra-Compact Photonic Structures

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