On ion transport during the electrochemical reaction on plane and GLAD deposited WO3 thin films

Kumar, Kiran; Shaik, Habibuddin; Chandrashekar, L. N.; Aishwarya, P.; Sattar, Sheik Abdul; Nithya, G; Madhavi, V.; Jafri, R. Imran; Gupta, Jyothi; Reddy, G.V. Ashok

doi:10.1016/j.matpr.2021.11.113

Cited by 16 publications

(1 citation statement)

References 32 publications

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“…On the contrary, physical methods are free of these shortcomings. Among them, the magnetron sputtering technique advantageously provides the highest throughput, adhesion, and uniformity of the deposited layers coupled with the possibility of adjusting precisely their thickness. ,− However, a drawback of this method is the formation of dense layers with low porosity and roughness, while a highly developed surface determined by porosity and roughness is crucial for providing a large contact area between the electrochromic material and electrolyte needed for the coloration rate and efficiency. , …”

Section: Introductionmentioning

confidence: 99%

Deposition of Nanostructured Tungsten Oxide Layers by a New Method: Periodic Modulation of the Deposition Angle

Sychov,

Eruzin,

Semenova

et al. 2023

Langmuir

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Periodic modulation of the deposition angle (PMDA) is a new method to deposit nanostructured and continuous layers with controllable periodic density fluctuation. The method is used for the magnetron sputtering of a WO 3 layer for an electrochromic device (ECD). An experimental study indicates that the electrochromic coloration-bleaching rate nearly doubles and the electrochromic efficiency grows by about 25% in comparison with the traditional method. The ECD efficiency rises with the increasing degree of nanostructure ordering, surface roughness, and homogeneity of the WO 3 layer. The method is promising for coating deposition techniques needed to produce versatile devices with specific requirements for ion transport in surface layers, coatings, and interfaces, such as fuel cells, batteries, and supercapacitors.

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