2019
DOI: 10.7567/1347-4065/ab3de3
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On-line detection method based on optimal modified lateral shearing interferometry for evaluating the damage growth characteristics

Abstract: The damage growth characteristic determines the lifetime of optical components and the operating costs of high power laser systems. Knowledge of the lateral size and the depth of damage sites are crucial to evaluate the subsequent growth. An on-line detection method based on optimal modified lateral shearing interferometry is proposed to simultaneously measure the lateral size and the depth of damage sites. Thus, the damage growth characteristics can be estimated more comprehensively and efficiently. In the pr… Show more

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Cited by 2 publications
(2 citation statements)
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“…However, along with the rapid development of computer processing technology, the accuracy and stability of the wavefront measurement methods are proposed higher requirements. Lateral shearing interferometry (LSI) technology has become an effective tool in wavefront measurement due to its unique advantage that it does not require an ideal reference wavefront [2][3][4][5][6][7][8]. In recent years, researchers have presented many types of LSI wavefront measurement methods and have also applied different technologies to LSI design [1,3,4,6,[8][9][10].…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…However, along with the rapid development of computer processing technology, the accuracy and stability of the wavefront measurement methods are proposed higher requirements. Lateral shearing interferometry (LSI) technology has become an effective tool in wavefront measurement due to its unique advantage that it does not require an ideal reference wavefront [2][3][4][5][6][7][8]. In recent years, researchers have presented many types of LSI wavefront measurement methods and have also applied different technologies to LSI design [1,3,4,6,[8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…Lateral shearing interferometry (LSI) technology has become an effective tool in wavefront measurement due to its unique advantage that it does not require an ideal reference wavefront [2][3][4][5][6][7][8]. In recent years, researchers have presented many types of LSI wavefront measurement methods and have also applied different technologies to LSI design [1,3,4,6,[8][9][10]. Among them, polarization phase-shifting technology is one of the most effective methods for improving accuracy in LSI, especially in terms of the spatial phase-shifting simultaneous acquisition, it shows the advantages of simplicity, reliability, and small errors [7,11,12].…”
Section: Introductionmentioning
confidence: 99%