“…[1][2][3] The device performance is, however, still limited by Auger recombination, 4,5 charge separation, 6-9 current crowding, [10][11][12] insufficient hole injection, 9,[13][14][15][16][17][18] and electron overflow from the MQW active region. [19][20][21][22] In order to address these issues, a staggered quantum well architecture and also InGaN/GaN MQWs with Si-step-doped quantum barriers have been proposed to screen the quantum confined Stark effect (QCSE) and increase the spatial overlap of electron-hole wave functions, [7][8][9] while an improved current spreading can be obtained either by making the p-type layer more resistive or the p-contact layer more conductive. 10,11 Additionally, an improved crystal quality is also essential for improving the device efficiency.…”