2010
DOI: 10.1088/0022-3727/43/46/465201
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On the measurement of energy fluxes in plasmas using a calorimetric probe and a thermopile sensor

Abstract: Two different diagnostics for the determination of the energy influx in plasma processes were used to characterize an ion beam source and an asymmetric RF discharge. The related energy fluxes were measured in dependence on the ion energy and on the RF power, respectively. The first sensor, called HFM (Heat Flux Microsensor) is a thermopile which allows for direct energy flux measurements. With the second sensor, a calorimetric probe, the energy influx has been calculated from the temporal temperature evolution… Show more

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Cited by 26 publications
(18 citation statements)
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“…Comparison that we have done in previous work has evidenced drawbacks and advantages of both sensors [22]. The main advantage of the calorimetric probe is its low cost, simplicity and sturdiness.…”
Section: Comparison With Other Heat Flux Probesmentioning
confidence: 74%
“…Comparison that we have done in previous work has evidenced drawbacks and advantages of both sensors [22]. The main advantage of the calorimetric probe is its low cost, simplicity and sturdiness.…”
Section: Comparison With Other Heat Flux Probesmentioning
confidence: 74%
“…Active probes are also established, constructed as a planar substrate or as a rotationallysymmetric membrane, whereby the energy influx is determined by the measurement of a temperature gradient [3][4][5]. However, the temperature of these probes is not freely adjustable and its distribution along the surface is not constant.…”
Section: Introductionmentioning
confidence: 99%
“…Different methods are established for determination the energy flux at plasmatechnological processes: for example by measuring the temperature difference generated on a substrate [1,6], by measuring the increasing temperature in the centre of a membrane being exposed to an energy flux and clamped and cooled by a guard ring [4,7], or by recording the temporal heating and cooling temperature course of a dummy substrate [5,8,9].…”
Section: Introductionmentioning
confidence: 99%
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