2008
DOI: 10.1109/led.2007.914089
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On the Roll-Off of the Activation Energy Plot in High-Temperature Flash Memory Retention Tests and its Impact on the Reliability Assessment

Abstract: In this letter, we discuss the experimental behavior of high-κ interpoly dielectrics in floating gate memory devices with respect to the activation energy plot. It is shown that the Arrhenius extrapolation may overestimate the ten-year lifetime predictions. However, a clear correlation between the activation energy plot and the trap levels in the interpoly dielectric can be established, based on theoretical grounds. It is shown that a single-trap level typically follows an 1/T law, while a roll-off of the acti… Show more

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Cited by 31 publications
(11 citation statements)
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“…Moreover, the retention characteristics of the device were still good even at 80% humidity, and the retention time was extrapolated to more than ten years. [38][39][40][41][42][43][44][45][46] These results are a clear indication that our device has high electrical stability. These results are a clear indication that the device has high electrical stability.…”
Section: Resultsmentioning
confidence: 82%
“…Moreover, the retention characteristics of the device were still good even at 80% humidity, and the retention time was extrapolated to more than ten years. [38][39][40][41][42][43][44][45][46] These results are a clear indication that our device has high electrical stability. These results are a clear indication that the device has high electrical stability.…”
Section: Resultsmentioning
confidence: 82%
“…17). This particular behavior of the HfAlO has been found to be due to different levels of traps [18], of which the shallow one(s) determine the hightemperature behavior. These trap levels are also giving some V T instability if ECS Transactions, 19 (2) 649-668 (2009) programming is not carried out in the saturation-free regime, where no charge is injected/trapped in the IPD.…”
Section: Ecs Transactions 19 (2) 649-668 (2009)mentioning
confidence: 99%
“…The traps are distributed within a band of 1.7-2.2 eV. Compared to the Al 2 O 3 conduction band edge these are rather deep, which leads to a low temperature activation [18]. Further improvement in retention is achievable by reducing the trap density and/or increasing the physical thickness of the high-k layer.…”
Section: Al 2 O 3 -Based Ipd'smentioning
confidence: 99%
“…1(a) for FG cells and Fig. 1(b) for CT memory cells [5][6][7][8][9][10][11]. This characteristics give rise to the problem that the expected lifetime varies according to the choice of the activation energy depending on the stress temperatures.…”
Section: Introductionmentioning
confidence: 99%