One nanometer structure fabrication using electron beam induced deposition

Dorp, Willem F. van; Hagen, C. W.; Crozier, Peter; Someren, B. van; Kruit, P.

doi:10.1016/j.mee.2006.01.155

Cited by 25 publications

(24 citation statements)

References 7 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…81 While for large deposits the deposited mass is identical every time the experiment is repeated, a significant variation in mass is found for the very smallest deposits. Van Dorp et al 82 deposited arrays of sub-5-nm dots on an a-C substrate with a constant dwell time per array. A typical array is shown in Fig.…”

Section: Widthmentioning

confidence: 99%

A critical literature review of focused electron beam induced deposition

Dorp

Hagen

2008

Journal of Applied Physics

486

577

View full text Add to dashboard Cite

An extensive review is given of the results from literature on electron beam induced deposition. Electron beam induced deposition is a complex process, where many and often mutually dependent factors are involved. The process has been studied by many over many years in many different experimental setups, so it is not surprising that there is a great variety of experimental results. To come to a better understanding of the process, it is important to see to which extent the experimental results are consistent with each other and with the existing model. All results from literature were categorized by sorting the data according to the specific parameter that was varied ͑current density, acceleration voltage, scan patterns, etc.͒. Each of these parameters can have an effect on the final deposit properties, such as the physical dimensions, the composition, the morphology, or the conductivity. For each parameter-property combination, the available data are discussed and ͑as far as possible͒ interpreted. By combining models for electron scattering in a solid, two different growth regimes, and electron beam induced heating, the majority of the experimental results were explained qualitatively. This indicates that the physical processes are well understood, although quantitatively speaking the models can still be improved. The review makes clear that several major issues remain. One issue encountered when interpreting results from literature is the lack of data. Often, important parameters ͑such as the local precursor pressure͒ are not reported, which can complicate interpretation of the results. Another issue is the fact that the cross section for electron induced dissociation is unknown. In a number of cases, a correlation between the vertical growth rate and the secondary electron yield was found, which suggests that the secondary electrons dominate the dissociation rather than the primary electrons. Conclusive evidence for this hypothesis has not been found. Finally, there is a limited understanding of the mechanism of electron induced precursor dissociation. In many cases, the deposit composition is not directly dependent on the stoichiometric composition of the precursor and the electron induced decomposition paths can be very different from those expected from calculations or thermal decomposition. The dissociation mechanism is one of the key factors determining the purity of the deposits and a better understanding of this process will help develop electron beam induced deposition into a viable nanofabrication technique.

show abstract

Section: Widthmentioning

confidence: 99%

A critical literature review of focused electron beam induced deposition

Dorp

Hagen

2008

Journal of Applied Physics

486

577

View full text Add to dashboard Cite

show abstract

“…In this paper experimental results are presented of the first stage of the growth process of electron beam induced deposits on various substrates and under varying growth conditions. Apart from the statistical variation in deposited mass as reported earlier [7,8], quite unexpected results are obtained, which are not well understood, yet clearly demonstrate the importance of the substrate and the growth conditions. …”

mentioning

confidence: 68%

The nucleation stage in electron beam induced deposition

Hagen¹,

Dorp²,

Crozier³

2008

J. Phys.: Conf. Ser.

View full text Add to dashboard Cite

With electron beam induced deposition structures as small as 1 nm can be deposited. The nucleation stage of the growth of such deposits is studied in dependence of the substrate material and substrate temperature. On amorphous carbon foils larger deposit sizes are obtained at higher substrate temperatures during growth. On SiN membranes unusually high growth rates are observed which seem to relate to charging effects. 1. Introduction Electron beam induced deposition (EBID) is recently drawing attention as a potential nanofabrication technique. In an increasing number of groups it was demonstrated that nanostructures even down to 1 nm in size can be fabricated using EBID [1-5]. The principle of EBID is that precursor molecules, adsorbed on a substrate surface, are dissociated as a result of the interaction between an incident electron beam and the gas-substrate system. The ideal precursor consists of gas molecules that contain the material to be deposited, a metal for instance, and some ligands which are easily separated from the metal atom by the interaction with electrons, to form volatile fragments that are easily pumped away. As electron beams can be focused to 0.1 nm in today's state of the art electron microscopes, ultra-high resolution patterning becomes possible. The resolution is for a large part determined by the size of the secondary electron emission area around the point of impact of the primary electron beam. Using Monte Carlo simulations of the electron-substrate interactions and the electron induced precursor dissociation it was predicted that this area is so small that a spatial deposition resolution better than 1 nm can be achieved [6]. However, other factors as the interaction between the precursor and the substrate including adsorption and desorption and diffusion, were not taken into account, but may play a role in the spatial resolution and the growth rate as well. When aiming at sub-nm deposits, i.e. the nucleation stage of the growth, the substrate surface topography will become important, as well as the surface condition. In this paper experimental results are presented of the first stage of the growth process of electron beam induced deposits on various substrates and under varying growth conditions. Apart from the statistical variation in deposited mass as reported earlier [7,8], quite unexpected results are obtained, which are not well understood, yet clearly demonstrate the importance of the substrate and the growth conditions.

show abstract

“…Using helium and neon beams to deposit insulators can be superior in such cases due to their inert nature. It should be mentioned that 1 nm sized structures through electron beam induced deposition were reported in recent past [14].…”

Section: Advantages Of Helium and Neon Over Gallium Fib For Nanofabrimentioning

confidence: 99%

Sub-10 nm nanofabrication with the helium and neon ions in ORION NanoFab

Singh¹

2013

AIP Conference Proceedings

View full text Add to dashboard Cite

High temperature focused ion beam response of graphite resulting in spontaneous nanosheet formation Ideally ordered 10 nm channel arrays grown by anodization of focused-ion-beam patterned aluminum Abstract. With the advancement of scientific research, nanofabrication is continually being pushed to its limits. For rapid prototyping and fast turnaround, gallium focused ion beam (FIB) based instruments are often used. These charged particle instruments offer great flexibility and high throughput for prototyping customized devices for research and development as well as industrial applications. A new entrant in the field of nanofabrication using charged particle beams is the ORION NanoFab made by Carl Zeiss. In ORION NanoFab, helium and neon ions can be used to produce features as small as few nanometers. In this article, we will describe the advantages and limitations of helium and neon ion based nanofabrication.

show abstract

One nanometer structure fabrication using electron beam induced deposition

Cited by 25 publications

References 7 publications

A critical literature review of focused electron beam induced deposition

A critical literature review of focused electron beam induced deposition

The nucleation stage in electron beam induced deposition

Sub-10 nm nanofabrication with the helium and neon ions in ORION NanoFab

Contact Info

Product

Resources

About