2014
DOI: 10.1016/j.mssp.2014.03.034
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Optical and electrical properties of pure and Sn4+-doped n-SnS films deposited by chemical bath deposition

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Cited by 17 publications
(3 citation statements)
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“…SnS thin films may be prepared by a variety of methods, including chemical bath deposition, , chemical vapor deposition, electrochemical deposition, , spray pyrolysis, , thermal evaporation, , vapor transport deposition, and atomic layer deposition (ALD). , The electrical and optical properties of SnS can be modified by changing the stoichiometry of the films or their doping, without changing the crystal structure …”
Section: Introductionmentioning
confidence: 99%
“…SnS thin films may be prepared by a variety of methods, including chemical bath deposition, , chemical vapor deposition, electrochemical deposition, , spray pyrolysis, , thermal evaporation, , vapor transport deposition, and atomic layer deposition (ALD). , The electrical and optical properties of SnS can be modified by changing the stoichiometry of the films or their doping, without changing the crystal structure …”
Section: Introductionmentioning
confidence: 99%
“…The effect of changes in the S source concentration on the band gap of o-SnS films is controversial until the present. A reduction in band gap from 1.70 eV to 1.25 eV with increasing TA concentrations was reported in [ 200 ], although no significant change in band gap was found with TA concentration in [ 198 ]. On the other hand, no studies in the literature have focused on the influence of S precursor concentration on the properties of c-SnS, SnS 2, and Sn 2 S 3 films.…”
Section: Influence Of Deposition Parameters On Sn X S Y Thin Film Growth and Propertiesmentioning
confidence: 94%
“…SnS films have been deposited by various techniques such as atomic layer deposition [14], chemical bath deposition [15], hydrothermal method [16], mechanochemical route [17], silar method [18], spray pyrolysis [19], electron beam evaporation [20], sputtering [21], electrodeposition [1,12,22,23] and vacuum evaporation [4]. Among these techniques, electrodeposition is simple, inexpensive and convenient for large area deposition.…”
Section: Introductionmentioning
confidence: 99%