Optical and mechanical characterization of evaporated SiO_2 layers Long-term evolution

Scherer, Karin; Nouvelot, Luc; Lacan, P.; Bosmans, R.

doi:10.1364/ao.35.005067

Cited by 34 publications

(17 citation statements)

References 8 publications

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“…At higher Xe flow rates, the stretching peak continues to shift to higher wavenumbers for more than one month. This can be explained by a stress relaxation with time, as proposed for pure silica films 21 . A shift to lower wavenumbers, which is an indication of fluorine loss, never occurs for films deposited with high Xe flow rates.…”

Section: 21mentioning

confidence: 75%

Molecular-ion-beam-assisted deposition of stable SiOF films

Scherer¹,

Lacan²,

Brunet-Bruneau³

et al. 2004

SPIE Proceedings

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Recently 1 we reported on low refractive index fluorinated silica (SiOF) films obtained by a Molecular Ion Beam Assisted Deposition (MIBAD) process, using a fluorocarbon precursor in an End Hall ion source during evaporation of silica grains. These films were unstable due to moisture absorption and a subsequent chemical reaction, leading to an irreversible change in composition and increase of refractive index. In this paper we investigate an inert gas enhanced MIBAD process, involving the simultaneous use of a fluorocarbon precursor and an inert gas in the ion gun. Ion beam composition was analyzed by energy selective ion mass spectrometry. Addition of inert gas to the fluorocarbon precursor not only increases the total ion current, but also enhances the dissociation of the fluorocarbon precursor into smaller fragments. The films were characterized by ellipsometry, IR transmission spectroscopy and in situ and ex situ stress measurements. Time evolution of film properties was followed for several weeks. For a given fluorocarbon precursor flow rate, refractive index measured directly after deposition increases with increasing inert gas flow rate, while refractive index change with time is reduced. Fluorine content in the films is maximum for low inert gas flow rates, but decreases for higher flow rates to reach approximately the same level as for pure fluorocarbon ion beam. The observed refractive index stabilization for high inert gas flow rates can be explained by a change in film structure rather than film composition, i.e. by reduced film porosity due to high inert gas ion bombardment. With carefully chosen deposition conditions, stable films with low refractive index can be obtained.

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Section: 21mentioning

confidence: 75%

Molecular-ion-beam-assisted deposition of stable SiOF films

Scherer¹,

Lacan²,

Brunet-Bruneau³

et al. 2004

SPIE Proceedings

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“…56 Indeed, our spectra are in good agreement with other silica spectra found elsewhere. 55,57 Moreover, it is well known in the literature that metal-oxide-based materials produce IR bands between 400-1000 cm À1 due to the interatomic vibrations. 58,59 Thus, the IR signals at 465 and 415 cm À1 are assigned to NiO and MgO, respectively.…”

Section: Resultsmentioning

confidence: 99%

Experimental and computational modeling studies on silica-embedded NiO/MgO nanoparticles for adsorptive removal of organic pollutants from wastewater

2017

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“…SiO 2 Type A is deposited along with oxygen gas, whereas SiO 2 Type B deposition does not involve the introduction of an additional gas. This difference in processing has been shown to effectively generate different levels of residual stress within the SiO 2 layers because gas scattering during deposition increases porosity [12]. SiO 2 Type C was deposited under the same conditions as SiO 2 Type B but received a surface CONTACT J. Alexis joel.alexis@enit.fr pretreatment before deposition consisting of an ionic pre-cleaning by argon ion bombarding [11,[13][14][15].…”

Section: The Multilayer System Under Studymentioning

confidence: 99%

Mechanical adhesion of SiO₂ thin films onto polymeric substrates

Alexis

Dalverny

Balcaen

et al. 2019

Surface Engineering

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Quantification of adhesion between a 200 nm silicon dioxide layer and a 4.5 μm thick polymeric coating was performed by analysing the SiO 2 buckle morphologies generated under compressive stress. Impacts of mechanical properties of SiO 2 layers, as well as a surface pretreatment on adhesion, are shown. Interfacial toughness of both configurations are assessed using the Hutchinson and Suo model, which involves buckle dimensions determined in situ by an optical profilometer, and elastic modulus E f , of the SiO 2 thin films, characterised by nanoindentation. The surface pretreatment led to initiation of buckling at a higher strain. The same trend is observed for a layer with a lower stiffness and residual stress.

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Optical and mechanical characterization of evaporated SiO_2 layers Long-term evolution

Cited by 34 publications

References 8 publications

Molecular-ion-beam-assisted deposition of stable SiOF films

Molecular-ion-beam-assisted deposition of stable SiOF films

Experimental and computational modeling studies on silica-embedded NiO/MgO nanoparticles for adsorptive removal of organic pollutants from wastewater

Mechanical adhesion of SiO₂ thin films onto polymeric substrates

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Optical and mechanical characterization of evaporated SiO_2 layers Long-term evolution

Cited by 34 publications

References 8 publications

Molecular-ion-beam-assisted deposition of stable SiOF films

Molecular-ion-beam-assisted deposition of stable SiOF films

Experimental and computational modeling studies on silica-embedded NiO/MgO nanoparticles for adsorptive removal of organic pollutants from wastewater

Mechanical adhesion of SiO2 thin films onto polymeric substrates

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Product

Resources

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Mechanical adhesion of SiO₂ thin films onto polymeric substrates