Optical characterization of low optical thickness thin films from transmittance and back reflectance measurements

Laaziz, Yassin; Bennouna, A.; Chahboun, N.; Outzourhit, A.; Ameziane, E.L.

doi:10.1016/s0040-6090(00)00997-4

Cited by 66 publications

(33 citation statements)

References 21 publications

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“…The experimental data of R and T were corrected due to the substrate effects according to the method given in Ref. [26], which needs to measure the reflectance from both sides of the film/substrate system. The optical bandgap E g is evaluated according to the well-known relation [27,28]:…”

Section: Optical-electronic Propertiesmentioning

confidence: 99%

Transparent conducting properties of samarium-doped CdO

Dakhel

2009

Journal of Alloys and Compounds

101

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Section: Optical-electronic Propertiesmentioning

confidence: 99%

Transparent conducting properties of samarium-doped CdO

Dakhel

2009

Journal of Alloys and Compounds

101

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“…and R exp. of the transmittance and reflectance at normal incidence until the difference becomes lower than the accuracy of the measurements, ∆T and ∆R [10][11]. …”

Section: Resultsmentioning

confidence: 97%

Optical and electrical properties of very thin chromium films for optoelectronic devices

Lozanova¹,

Atanasova²,

Soserov³

et al. 2014

J. Phys.: Conf. Ser.

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Abstract. Establishing the optimal experimental conditions for the development of transparent metal contacts to be used in optoelectronic devices, such as organic light-emitting diodes and solar cells, is an important task. In this paper we present an overview of the development of very thin e-beam-deposited chromium films with high optical transparency. The surface morphology is investigated by scanning electron microscopy. The variation is examined of the films' electrical and optical properties (transmittance and complex refractive index) with the variation of the thickness and deposition rate. We observed that, for a given thickness of the chromium films, the absorption coefficient increases when the deposition rate is decreased. We also found that the thin films with a thickness of less than 10 nm show an average transmittance exceeding 60 % in the spectral range 400 -1500 nm. The films' resistivity, ρ, is determined by the four-point probe method. The value of ρ varies in the range of 10 -3 − 10 −4 Ω cm for chromium coatings in the thickness interval 5 − 100 nm. The results obtained show that very thin metal films could be an alternative to the transparent conductive oxides. IntroductionThin chromium films have found many applications, for example as layers for improvement of the adhesion to transparent substrates [1], in mask production [2] and as transparent electrodes [3]. Recently, it has been demonstrated that the ultrathin transparent metal contacts provide a number of advantages over the more commonly used conductive transparent metal oxides, such as indium tin oxide (ITO) [4]. According to [5], chromium and nickel thin films possess optical transparency comparable to that of the ITO in the visible and near-infrared range (0.4 − 2.5 μm), while it can be significantly higher in the ultraviolet (175 − 400 nm) and mid-infrared (2.5 − 25 μm) regions.The conditions of deposition, as deposition rate, temperature of substrate, etc., influence very strongly the properties of the metal coating [6]. It has been shown that the deposition rate and argon partial pressure in the case of cathode sputtering strongly affect the microstructure and electrical properties of thin chromium films [7,8]. Metal films deposited by ion-beam sputtering display exceptionally low surface roughness, the films being as thin as about 20 Å [3].The goal of the present work is the investigation of the optical and electrical properties of very thin chromium films deposited by an electron-beam technique.

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“…Therefore, the optical constants ðn; a; kÞ can be determined from the reflectance and transmittance measurements by solving Eqs. (1)-(4) [9][10][11][12][13][14][15][16][17][18][19][20][21][22][23] at various combination conditions (the measurements from the front or back side, the normal or oblique or multiple angles incidence, the perpendicular or parallel polarized or unpolarized radiation). For three-layer semi-transparent structure, the measurements of the target layer were affected by two side window layers.…”

Section: Radiative Transfer Modelmentioning

confidence: 99%

“…The spectrophotometric method was wildly used to determine the optical constants of thin films from the reflectance and transmittance measurements based on the minimization process of the difference between the calculated and the measured values [9][10][11][12][13][14][15][16][17][18][19][20][21][22][23], or based on the interference fringe patterns process [24][25][26][27][28][29][30]. And various combinations of measured quantities at various conditions (the transmittance, the reflectance from the front or back side, the normal or oblique or multiple angles incidence, the perpendicular or parallel polarized radiation) can be used.…”

Section: Introductionmentioning

confidence: 99%

Measurement method for high-temperature infrared optical constants of ZnS crystal materials in a multi-layer structure

Liu

2015

Infrared Physics & Technology

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Optical characterization of low optical thickness thin films from transmittance and back reflectance measurements

Cited by 66 publications

References 21 publications

Transparent conducting properties of samarium-doped CdO

Transparent conducting properties of samarium-doped CdO

Optical and electrical properties of very thin chromium films for optoelectronic devices

Measurement method for high-temperature infrared optical constants of ZnS crystal materials in a multi-layer structure

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