Optical characterization of the mask writing process in bimetallic grayscale photomasks

Dykes, James M.; Chapman, Glenn H.

doi:10.1117/12.809975

Cited by 2 publications

(2 citation statements)

References 6 publications

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“…Current researches show that the grayscale photomask techniques based on different principle are inherent of very high resolution, and suitable to fabricate many kinds of microoptics structures such as microlens, waveguide, and other fine three-dimensional patterned grating and other functional devices, etc [1][2][3][4][5][6][7][8][9][10][11][12][13] . So far, the typical grayscale fabrication approaches include: the micro-mirror projection display, the high energy beam sensitive glass photomask, the halftone photomask, the modulated scanning laser beam or e-beam method, the ion exchange processing, etc.…”

Section: Introductionmentioning

confidence: 99%

Dot distribution type of grayscale mask and colorscale photomask for fabrication diffractive and refractive microlens arrays

Tang

2013

MIPPR 2013: Remote Sensing Image Processing, Geographic Information Systems, and Other Applications

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The fundamental relations of the ultraviolet (UV) light transmittance of the soft polymer film filled by a large number of basic micro-pattern-structures composed of micro-squares, are acquired experimentally. The polymer films with different distribution density of basic color-micro-pattern-structure in the visible range, are also constructed easily, so as to perform single photomask photolithography for fabrication microlenses with very fine surface profile. The patterned polymer films demonstrate a modulated UV-light penetrating property. Models for describing the penetrating behaviors of UV-light over polymer films covered by a large number of basic grayscale or colorscale micro-patternstructures constructed, for instance, typical micro-square and other micro-pattern-structures shaped by partially overlapping several micro-squares, are set up. Several key factors, which influence the penetrating behavior of UV-light, and then the surface character, and also the quality of correspondent functioned micro-structures in photoresist and further substrate, such as diffractive or refractive microlens, are discussed carefully. The UV-light transmitting measurements demonstrate a desired UV-light intensity variance trend, which is basically consistent with theoretical prediction.

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Section: Introductionmentioning

confidence: 99%

Dot distribution type of grayscale mask and colorscale photomask for fabrication diffractive and refractive microlens arrays

Tang

2013

MIPPR 2013: Remote Sensing Image Processing, Geographic Information Systems, and Other Applications

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“…The former needs many steps such as film deposition, lithography, etching, resist striping, etc., while the latter processes a very complicated material system used for electron beam, both of which are expensive that limits their industrial applications. Metaltransparent-metallic-oxides (MTMO) were first proposed and experimentally demonstrated by Chapman et al [5] and subsequently explored as grayscale masks [6][7][8][9][10][11][12][13]. In a parallel research Qian Liu et al have been exploring grayscale implementations [14][15][16][17][18].…”

Section: Introductionmentioning

confidence: 99%

Numerical analysis of the sub-wavelength fabrication of MTMO grayscale photomasks by direct laser writing

Xia¹,

Zhang²,

Wang³

et al. 2014

Opt. Express

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Metal-transparent-metallic-oxide (MTMO) grayscale photomasks fabricated by direct laser writing have been proposed in recent years. The fabrication mechanism is attributed to light-induced melt-oxidization. The temporal-spatial distribution of temperature fields of indium film-glass samples under a laser pulse have been calculated by the Finite-Difference Time-Domain method. The laser action area of the indium film is studied based on the oxidation theories and the absorbed laser power density distribution in molten indium films. The calculated average sub-wavelength fabrication diameter of 302 nm is consistent with the experimental fabrication size under a laser power of 6.0 - 8.0 mW.

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Optical characterization of the mask writing process in bimetallic grayscale photomasks

Cited by 2 publications

References 6 publications

Dot distribution type of grayscale mask and colorscale photomask for fabrication diffractive and refractive microlens arrays

Dot distribution type of grayscale mask and colorscale photomask for fabrication diffractive and refractive microlens arrays

Numerical analysis of the sub-wavelength fabrication of MTMO grayscale photomasks by direct laser writing

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