“…These are derived from TiO, which belongs to a broad family of compounds with hard refractory metals consisting of nitride and carbide binary derivatives of IIIA, IVA, and VA transition metals [3,4]. Also, TiO exhibits a low electrical resistivity around 400 μΩ cm and high efficiency as a diffusion barrier against the interdiffusion of Al and Si [1,5]. Stoichiometric TiO spontaneously indicates 15% vacancies in an approximated one-to-one ratio, and the vacancy ordered structure is thermodynamically favoured regarding the undefective solid [4,6].…”