Visible and infrared photocatalytic activity of TiO  thin films prepared by reactive sputtering

Zapata‐Torres, M.; Hernández-Rodríguez, E.; Mis-Fernández, R.; Meléndez‐Lira, M.; Amaya, O. Calzadilla; Bahena, Daniel; Rejón, V.; Peña, J. L.

doi:10.1016/j.mssp.2015.07.072

Cited by 14 publications

(6 citation statements)

References 39 publications

(45 reference statements)

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“…In other words, the deposition of oxygen-deficient film should be carried out in metallic mode. Films deposited in oxygen-deficient conditions correspond to those at Ti 2 O 3 :TiO 2 equilibrium, and it can be expected a mixture of different titanium oxides (TiO 2 and Ti 2 O 3 ), as reported by other authors 14,15 From the literature, the Ti 2 O 3 oxygen-deficient phase has gained less attention in comparison to stoichiometric TiO 2 . However Ti 2 O 3 features thermochromic and photocatalytic properties, allows absorption of visible light, has relatively high electrical conductivity and is able to serve as a transparent conductor (TCO) 16,17 .…”

Section: Introductionsupporting

confidence: 62%

“…DC bias voltage below |-100V| is not effective because the ion current drawn at the substrate is not sufficiently energetic; on the higher limit, a bias voltage above |-200V| produced excessive re-sputtering on the film surface. Other authors have found a significant increase in the ion current drawn at the substrate holder due to the pulsing substrate bias voltage in the mid-frequency range 100-350 kHz 14 . However, within this frequency range, the voltage "time off" is too short for cancelling the static positive charge accumulated at the insulator substrate (this neutralization should be done mainly by electrons flowing from the glow discharge).…”

Section: Methodsmentioning

confidence: 93%

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Nb-doped Ti2O3 Films Deposited Through Grid-Assisted Magnetron Sputtering on Glass Substrate: Electrical and Optical Analysis

et al. 2019

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Niobium doped dititanium trioxide (Ti 2 O 3 :Nb) films were deposited on glass substrates, through grid-assisted magnetron sputtering. The Ti 2 O 3 :Nb films were characterized by X-ray diffraction (XRD), electrical conductivity and optical properties. Film deposition was carried out in two different substrate bias modes: DC and unipolar pulsed. Results show that the negative-pulsed mode improves conductivity and crystallinity. The XRD results show peaks corresponding crystallographic planes of Ti 2 O 3. No niobium oxide Nb x O y peaks were observed, which indicates that niobium oxide if formed, is amorphous, and/or substituted Nb atoms remain in a solid solution within the Ti2O3 structure. It was observed that "as-deposited" Ti 2 O 3 :Nb films (without post annealing) are transparent and electrical conductive, with transmittance that reaches 60% in the visible light wavelength despite the considerable thickness of the film and a miminum resistivity of 2x10-2 Ω.cm which indicates that there is potential for application as Transparent Conductive Oxide (TCO).

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Section: Introductionsupporting

confidence: 62%

Section: Methodsmentioning

confidence: 93%

Nb-doped Ti2O3 Films Deposited Through Grid-Assisted Magnetron Sputtering on Glass Substrate: Electrical and Optical Analysis

et al. 2019

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“…As an active metal, Ti could react with oxygen in the air to form a layer of TiO 2 on its surface. Thus, although these films were prepared with different oxygen flows, their surfaces were oxidized to TiO 2 , which was the same as the work of Zapata-Torres [ 15 ] et al To obtain the inner information of these films, the TiO 2 on the surface should be removed. However, it is worth noting that ion etching will reduce Ti 4+ to Ti 3+ and Ti 2+ [ 25 ].…”

Section: Resultsmentioning

confidence: 99%

“…In general, black TiO x film exhibits more catalytic application potential than TiO x powders [ 10 ]. Therefore, all kinds of methods such as electrospinning [ 11 ], the sol–gel process [ 12 ], pulsed laser deposition (PLD) [ 13 ], hydrogen treating [ 14 ], H 2 plasma-assisted deposition [ 6 ], and reactive magnetron sputtering [ 15 ] have been used to fabricate black TiO x films. Among those methods, reactive magnetron sputtering is widely applied to fabricate films for industrial production, employing gas to react with sputtered atoms to obtain compounds.…”

Section: Introductionmentioning

confidence: 99%

“…The structure and composition of black TiO x films can be tuned by controlling the O 2 /Ar flow ratio in reactive magnetron sputtering to increase its optical absorbance of visible light and photocatalytic activity. Zapata-Torres et al [ 15 ] studied the oxygen mass flow during RF reactive magnetron sputtering to improve the infrared photocatalytic activity of black TiO x films. Adriano et al [ 16 ] also obtained TiO x films with tunable crystal structure by fine control of the O 2 /Ar ratio during reactive DC magnetron sputtering.…”

Section: Introductionmentioning

confidence: 99%

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Black TiOx Films with Photothermal-Assisted Photocatalytic Activity Prepared by Reactive Sputtering

Mao

et al. 2021

Materials

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Titanium oxide is widely applied as a photocatalyst. However, its low efficiency and narrow light absorption range are two main disadvantages that severely impede its practical application. In this work, black TiOx films with different chemical compositions were fabricated by tuning target voltage and controlling O2 flow during reactive DC magnetron sputtering. The optimized TiOx films with mixed phases (TiO, Ti2O3, Ti3O5, and TiO2) exhibited fantastic photothermal and photocatalytic activity by combining high light-absorptive Ti2O3 and Ti3O5 phases with the photocatalytic TiO2 phase. The sample prepared with oxygen flow at 5.6 ± 0.2 sccm and target voltage near 400 V exhibited excellent optical absorbance of 89.29% under visible light, which could improve surface temperature to 114 °C under sunlight. This film could degrade Rhodamine-B up to 74% after 150 min of UV irradiation. In a word, this work provides a guideline for fabricating black TiOx films with photothermal-assisted photocatalytic activity by reactive DC magnetron sputtering, which could avoid the usage of hydrogen and is convenient for quantity preparation.

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Solar energy harvesting by magnetic-semiconductor nanoheterostructure in water treatment technology

Mahmoodi

Bastami

Ahmadpour

2018

Environ Sci Pollut Res

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Photocatalytic degradation of toxic organic pollutants in the wastewater using dispersed semiconductor nanophotocatalysts has a number of advantages such as high activity, cost effectiveness, and utilization of free solar energy. However, it is difficult to recover and recycle nanophotocatalysts since the fine dispersed nanoparticles are easily suspended in waters. Furthermore, a large amount of photocatalysts will lead to color contamination. Thus, it is necessary to prepare photocatalysts with easy separation for the reusable application. To take advantage of high photocatalysis activity and reusability, magnetic photocatalysts with separation function were utilized. In this review, the photocatalytic principle, structure, and application of the magnetic-semiconductor nanoheterostructure photocatalysts under solar light are evaluated. Graphical abstract ᅟ.

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Visible and infrared photocatalytic activity of TiO thin films prepared by reactive sputtering

Cited by 14 publications

References 39 publications

Nb-doped Ti2O3 Films Deposited Through Grid-Assisted Magnetron Sputtering on Glass Substrate: Electrical and Optical Analysis

Nb-doped Ti2O3 Films Deposited Through Grid-Assisted Magnetron Sputtering on Glass Substrate: Electrical and Optical Analysis

Black TiOx Films with Photothermal-Assisted Photocatalytic Activity Prepared by Reactive Sputtering

Solar energy harvesting by magnetic-semiconductor nanoheterostructure in water treatment technology

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