2021
DOI: 10.1016/j.optmat.2020.110541
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Optical, electrical, and chemical characterization of nanostructured InxGa1-xN formed by high fluence In+ ion implantation into GaN

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Cited by 14 publications
(12 citation statements)
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“…Finally, n and p electrodes are deposited by utilizing the beam evaporation technique. [47,48] The chip size of conventional LEDs (for traditional solid-state lighting) is of the order of hundred microns to a few millimeters. The fabrication processes of micro-LEDs are the same as mentioned above for conventional LEDs, except for the smaller size of an LED mesa.…”
Section: Epitaxial Growth and Chip Processing Of Ledsmentioning
confidence: 99%
“…Finally, n and p electrodes are deposited by utilizing the beam evaporation technique. [47,48] The chip size of conventional LEDs (for traditional solid-state lighting) is of the order of hundred microns to a few millimeters. The fabrication processes of micro-LEDs are the same as mentioned above for conventional LEDs, except for the smaller size of an LED mesa.…”
Section: Epitaxial Growth and Chip Processing Of Ledsmentioning
confidence: 99%
“…GaN has a wide application and is not only limited to power electronics. Due to GaNs ability to conduct electrons more efficiently than silicon, GaN is also used in radio, light-emitting diode [24][25][26], in HEMTs [27], laser photodiode detectors [28], and radiation detectors [29].…”
Section: Problem With Using Gan As a Secondary Rectifiermentioning
confidence: 99%
“…4(a), the I-V curves of the detector under no illumination are nonlinear, which indicates that Schottky contact exists between graphene and nanowires. 28 In addition, the dark current of the detector is about 44 mA at À3 V with an area of $0.46 mm 2 . The spectral responsivity of the detector is dened as the photocurrent output under the action of the unit incident radiation power.…”
Section: Performance and Analysis Of Photodetectormentioning
confidence: 99%