2005
DOI: 10.1007/s11664-005-0201-7
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Optical emission characteristics of ablation plasma plumes during the laser-etching process of CdTe

Abstract: Optical emission and surface compositional change during the laser-etching process of CdTe are reported. The etching rate increases in proportion to the laser energy density. However, the increase in etching rate is suppressed because ablation plasma plumes generated by the laser irradiation at the energy densities above 0.4 J/cm 2 shield the laser beam. The etching rate at the energy density of 1.0 J/cm 2 has been determined to be 91 nm/pulse. Also, 80-µm-deep and 55-µm-wide trenches have been formed with the… Show more

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Cited by 7 publications
(5 citation statements)
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“…We believe that this factor is the component volatility. Due to different component volatilities, the laser ablation of multicomponent targets affects the target stoichiometry, since the more volatile components are released (evaporated) more efficiently than the less volatile ones [70–72] . Furthermore, this can strongly affect the expansion dynamics of the ablation plume [72–74] …”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…We believe that this factor is the component volatility. Due to different component volatilities, the laser ablation of multicomponent targets affects the target stoichiometry, since the more volatile components are released (evaporated) more efficiently than the less volatile ones [70–72] . Furthermore, this can strongly affect the expansion dynamics of the ablation plume [72–74] …”
Section: Resultsmentioning
confidence: 99%
“…Due to different component volatilities, the laser ablation of multicomponent targets affects the target stoichiometry, since the more volatile components are released (evaporated) more efficiently than the less volatile ones. [70][71][72] Furthermore, this can strongly affect the expansion dynamics of the ablation plume. [72][73][74] The relative volatility of the CoCrFeMnNi HEA components can be estimated based on the vapor pressure and boiling point of the corresponding materials (Table.…”
Section: Mass Spectrometric Studies Of the Hea Ablation Plumesmentioning
confidence: 99%
“…However, the etching rate was slowed and varied from 80 nm per pulse to 100 nm per pulse in the higher energy region from 0.4 J/cm 2 to 1.2 J/cm 2 . 13 The SEM image of deep trenches formed on the (211) CdTe wafer is shown in Fig. 1b.…”
Section: Resultsmentioning
confidence: 99%
“…to the surface of parts, which allows you to restore geometry, increase surface strength and corrosion resistance, etc. [1][2][3][4][5][6][7][8][9][10]. In this work we consider mass and heat transfer in the reaction chamber during the growth of an epitaxial layer using pulsed laser deposition.…”
Section: Introductionmentioning
confidence: 99%