Optical lithography: Present status and continuation below 0.25 μm

Wittekoek, S.

doi:10.1016/0167-9317(94)90104-x

Cited by 12 publications

(4 citation statements)

References 9 publications

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“…Approaches from the traditional (photo)lithographic field as well as developments of novel techniques have been reported. The lithographic methods are based on the patterning of a sensitive resist usually by light (Wittekoek 1994); novel techniques include microcontact printing (Mrksich and Whitesides 1995), imprinting (Chouet al 1996), and microfluidic networks (Delamarche et al 1997).…”

Section: Introductionmentioning

confidence: 99%

Characterization of biomolecule immobilization by scanning force microscopy using a wet‐masking technique

Fritzsche¹,

Ermantraut²,

Köhler³

1998

Scanning

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Summary:The assemblage of molecular layers was investigated using scanning force microscopy (SFM). A wet-masking technique was used for the preparation of monolayer steps by partial masking of the substrate with an elastomeric mask during incubation in the modification buffers. The subsequent adsorption of biotin, streptavidin, and biotinylated beads onto a gold substrate was investigated by SFM visualization of the created steps. The molecular layers were characterized based on measurements of step height and surface roughness. The simultaneous visualization of the surface before and after modification minimizes artifacts introduced by changes in tip shape or imaging parameters.

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Section: Introductionmentioning

confidence: 99%

Characterization of biomolecule immobilization by scanning force microscopy using a wet‐masking technique

Fritzsche¹,

Ermantraut²,

Köhler³

1998

Scanning

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“…Since their first appearance in the early 1980s, chemically amplified (CA) resists have evolved into a leading-edge patterning technology, capable of resolving sub-quarter-micron features. They were made possible by the development of photosensitive onium salts whose irradiation released strong acid; − these photoacid generators (PAG) were later combined with acid-sensitive poly( t -BOC−OSt). − Recent developments in CA resist chemistry, irradiation techniques, and process conditions have provided a basis for upcoming mass production of 1−4 Gbit DRAM and other devices with successively smaller critical dimensions. − …”

Section: Introductionmentioning

confidence: 99%

Functional Imaging with Chemically Amplified Resists and Organic Molecules

Vekselman

Zhang

Darling³

1997

Chem. Mater.

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Chemically amplified resists were tested for preparing universal templates to bind various organic species in micron-scale patterns (functional images). UV exposure and heating of a poly(di-tert-butyl fumarate-co-styrene):onium salt resist produced alternating areas of nonpolar ester and polar acid/anhydride polymers. Various compounds that were fluorescent dyes or amines could then be placed selectively either into or onto exposed or nonexposed areas, according to the nature of solvents and binding species. The ease and extent of immobilization were found to depend on (i) resist composition, (ii) matrix wettability and permeability by a solvent, and (iii) covalent, ionic, dipole-dipole, or other sorbate-matrix binding interactions.

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“…Here K 1 and K 2 are scaling factors that are determined by the lithography process. 27 The factor K 1 has been reduced from about 1.0 to below 0.7, mainly by resist and processing improvements. Using incoherent illumination, K 1 is below 0.5.…”

Section: Image Contrast and Resolutionmentioning

confidence: 99%

“…However, for photolithography two orders are sufficient to define useful patterns, because of the high contrast of the photoresist. 27 The maximum angle transmitted in the microlens array system is limited by vignetting effects within the imaging channels. To obstruct stray light and crosstalk between adjacent channels, all image-forming rays that pass the entrance pupil ͑lens L1͒ of an imaging channel must pass the exit pupil ͑lens L2͒ of the same channel ͑see Fig.…”

Section: Imaging Propertiesmentioning

confidence: 99%

Microlens array imaging system for photolithography

̈lkel

1996

Opt. Eng

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Abstract.A micro-optical system is proposed that uses a stack of four microlens arrays for 1:1 imaging of extended object planes. The system is based on the concept of multiple-aperture imaging. A compact system is presented that is remarkable in that it provides a diffraction-limited resolution of 3 m for unlimited object and image areas. Resolution of 5 m has been demonstrated for an area of 20ϫ20 mm 2 in an experimental setup using melting resist microlens arrays (190-m lens diameter). The investigated imaging system was developed in connection with a new contactless photolithographic technique called microlens lithography. This new lithographic imaging technique provides an increased depth of focus (Ͼ50 m) at a larger working distance (Ͼ1 mm) than with customary proximity printing. Potential applications are photolithography for large print areas (flat panel displays, color filters), for thick photoresist layers (micromechanics), on curved surfaces (or substrates with poor planarity), in V grooves, etc. © 1996 Society of Photo-Optical Instrumentation Engineers.

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Optical lithography: Present status and continuation below 0.25 μm

Cited by 12 publications

References 9 publications

Characterization of biomolecule immobilization by scanning force microscopy using a wet‐masking technique

Characterization of biomolecule immobilization by scanning force microscopy using a wet‐masking technique

Functional Imaging with Chemically Amplified Resists and Organic Molecules

Microlens array imaging system for photolithography

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