2011
DOI: 10.1364/ao.50.001945
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Optical properties and residual stress in aluminum nitride films prepared by alternating-current dual reactive magnetron sputtering

Abstract: Aluminum nitride films were deposited by alternating-current dual reactive magnetron sputtering. The influence of different nitrogen flow and working pressures at a sputtering power of 5 kW on the refractive index, extinction coefficient, crystalline structure, residual stress, and surface roughness of aluminum nitride films was discussed. The aluminum nitride film would have high refractive index, low extinction coefficient and small residual stress at suitable nitrogen flow rate and low working pressure.

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Cited by 2 publications
(1 citation statement)
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“…The most compelling CMOS compatible modulator devices presented have used direct electrooptic modulation of aluminum nitride (AlN) waveguiding layers [8][9][10]. Aluminum nitride can be used in CMOS fabrication with piezoelectric and electro-optic properties approximating single crystal films when grown by physical vapor deposition (PVD) [11]; however, these AlN films suffer from high optical losses at short wavelengths due to Rayleigh scattering arising from the polycrystallinity of aluminum nitride grown by PVD [10,12,13]. When applied to electro-optic modulation applications, this wavelength-dependent loss, combined with the large LVπ characteristic of aluminum nitride, results in fairly poor performance at near-visible wavelengths and shorter.…”
Section: Introductionmentioning
confidence: 99%
“…The most compelling CMOS compatible modulator devices presented have used direct electrooptic modulation of aluminum nitride (AlN) waveguiding layers [8][9][10]. Aluminum nitride can be used in CMOS fabrication with piezoelectric and electro-optic properties approximating single crystal films when grown by physical vapor deposition (PVD) [11]; however, these AlN films suffer from high optical losses at short wavelengths due to Rayleigh scattering arising from the polycrystallinity of aluminum nitride grown by PVD [10,12,13]. When applied to electro-optic modulation applications, this wavelength-dependent loss, combined with the large LVπ characteristic of aluminum nitride, results in fairly poor performance at near-visible wavelengths and shorter.…”
Section: Introductionmentioning
confidence: 99%