A key requirement for the growth of the wide bandgap nitrides, GaN and InGaN, is providing a sufficient supply of atomic nitrogen from the vapor phase during growth. In order to prevent a high concentration of nitrogen vacancies, especially for GaInN, one strategy is to use a precursor with a low pyrolysis temperature, thus yielding a high concentration of atomic nitrogen in the vapor phase. 1,1 dimethylhydrazine (DMHy), with an appropriate vapor pressure of 157 Torr at 25°C and a low pyrolysis temperature (T 50~4 20°C), is a promising candidate to replace NH 3 , the most common nitrogen source. The pyrolysis studies of DMHy suggest the rate limiting step for decomposition is a heterogeneous, unimolecular process that is independent of both input concentration and ambient. Radical reactions are also involved as indicated by the products. In He they include CH 4 , NH 3 , N 2 , H 2 , HCN, C 2 H 6 , CH 3 NCH 2 , and (CH 3 ) 2 NH. Experiments on the copyrolysis of DMHy and trimethylgallium show that an adduct is formed at room temperature followed by CH 4 elimination, presumably forming (CH 3 ) 2 GaNHN(CH 3 ) 2 . At higher temperatures, the products indicate that the covalent Ga-N bond doesn't dissociate during pyrolysis.