1999
DOI: 10.1002/(sici)1521-396x(199912)176:2<1071::aid-pssa1071>3.0.co;2-e
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Optical Properties of Bismuth Telluride Thin Films, Bi2Te3/Si(100) and Bi2Te3/SiO2/Si(100)

Abstract: In this work, we have studied bismuth telluride (Bi2Te3) thin films on Si(100) and SiO2/Si(100) substrates grown by Hot Wall Epitaxy (HWE) technique. The morphology of the surface was controlled by Atomic Force Microscopy (AFM). Reflection and transmission experiments in the mid‐infrared (MIR) spectral range were performed at room temperature. We have deduced the frequency dependence of the absorption coefficient. The refractive index was determined in the mid‐infrared (MIR) spectral range for these samples an… Show more

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Cited by 28 publications
(12 citation statements)
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“…Extinction coefficients and refractive indices are relatively high compared to the data reported by Dheepa [12], due to the optically thick films [27], and increase with wavelength for Se and Fe doped films of 150 nm thickness ( Fig. 8(a)) which is in accord with the literature [12,27,28]. …”
Section: Fig7: Spectral Dependence Of Transmittance (T) and Reflectasupporting
confidence: 89%
“…Extinction coefficients and refractive indices are relatively high compared to the data reported by Dheepa [12], due to the optically thick films [27], and increase with wavelength for Se and Fe doped films of 150 nm thickness ( Fig. 8(a)) which is in accord with the literature [12,27,28]. …”
Section: Fig7: Spectral Dependence Of Transmittance (T) and Reflectasupporting
confidence: 89%
“…Such features have already been observed by Kaddouri et al in reflectance spectra for 3-m samples obtained by hot-wall epitaxy. 21 In Fig. 7 Theoretical predictions do not agree with the experimental literature values obtained from transmission and reflection measurements.…”
Section: Resultsmentioning
confidence: 82%
“…[14][15][16][17][18] More recently, thin films were characterized by classical optical methods. [19][20][21][22] Only one work 20 was reported on thin films obtained by metallorganic chemical vapor deposition using spectroscopic ellipsometry ͑SE͒ in the visible range. Ellipsometry is an optical method for surface analysis based on the measurement of the change of the polarization state of a light beam during reflection.…”
mentioning
confidence: 99%
“…The IR annealing (0.5 kW IR source: 1500–5600 nm, i.e. 0.2214–0.8266 eV, corresponding to ∼20,000–100,000 cm –1 of absorption coefficient on Bi–Te film , ) was initially conducted in the same condition but with the sample held statically under the IR source to determine the effect of the maximum irradiation temperature. To measure the dynamic temperature on the film surface (i.e.…”
Section: Experimental Detailsmentioning
confidence: 99%