“…Recently, techniques based on reactive ion etching (RIE) and metal catalyzed chemical etching (MCCE) have been developed. Nevertheless, they also have some problems, such as costly facility, required operational conditions, and wasted liquid that may be harmful to the natural environment [ 37 , 45 , 46 , 47 , 48 , 49 , 50 , 51 , 52 , 53 ]. An appealing technique is that of directly ablating silicon surface to obtain âpenguin-likeâ microstructures via femtosecond lasering in toxic gas atmospheres such as SF 6 , Cl 2 , and H 2 S [ 51 , 54 , 55 , 56 , 57 , 58 , 59 , 60 , 61 , 62 ].…”