Optical properties of plasma polymer films (hexamethyldisiloxane)

Rochotzki, R.; Arzt, M.; Blaschta, F.; Kreyβig, E.; Poll, H.-U.

doi:10.1016/0040-6090(93)90308-c

Cited by 19 publications

(10 citation statements)

References 14 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…With increasing power input, which corresponds to an increase in the bias voltage, a linear increase in the refractive index is observed (Figure 9). Similar trends have been found for plasma polymerized methyl methacrylate (26), hexamethyl disiloxane (27), and tetramethyl silane (28). The refractive index of plasma polymerized styrene thin film is 1.78 at -130 V and 2.27 at -195 V at 70 mTorr.…”

Section: Where N C -H Is the Concentration Of C-h Bonds Per Cm 3 Ctsupporting

confidence: 78%

Deposition of Plasma-Polymerized Styrene under Ion Bombardment

Lee

Kim

Lee

1996

ACS Symposium Series

View full text Add to dashboard Cite

Ion bombardment on a growing film is an effective way to modify film properties. In this study, plasma polymerized styrene thin films are deposited on silicon wafers, glass plates, and polyimide films under varying degrees of ion bombardment in a 13.56 MHz, asymmetric plasma reactor. The degree of ion bombardment is varied by adjusting the power and pressure. FTIR spectra of the deposited films show that sp 2 fraction and hydrogen concentration decrease with increasing ion bombardment on the substrate. RBS data show that the atomic fraction of carbon is uniform throughout the film. Film adhesion is very poor above -325 V of substrate bias voltage at pressure of 70 mTorr. At lower substrate bias voltages, NH 4 OH cleaning enhances the adhesion of the film on silicon substrates, whereas higher substrate temperature gives better adhesion on glass plates.

show abstract

Section: Where N C -H Is the Concentration Of C-h Bonds Per Cm 3 Ctsupporting

confidence: 78%

Deposition of Plasma-Polymerized Styrene under Ion Bombardment

Lee

Kim

Lee

1996

ACS Symposium Series

View full text Add to dashboard Cite

show abstract

“…Lower carbon contents led to poor barrier efficiencies due to crack formation caused by a low flexibility of the coating, as observed in SEM images (not shown here). Coatings with higher carbon contents led also to poor barrier efficiencies, in this case caused by a lower cross‐linking degree of the films, as seen in the FTIR spectra 49…”

Section: Discussionmentioning

confidence: 99%

Reduction of Plasticizer Leaching from PVC by Barrier Coatings Deposited Using DBD Processes at Atmospheric Pressure

Barreto

Borris

Thomas

et al. 2012

Plasma Processes & Polymers

View full text Add to dashboard Cite

Barrier coatings against plasticizer leaching are deposited on flexible polyvinylchloride (PVC) films typically used in flooring or in the automotive industry. Octamethylcyclotetrasiloxane (OMCTS) and hexamethyldisiloxane (HMDSO) are plasma polymerized using plasma‐activated CVD (PA‐CVD) based on an atmospheric pressure (AP) dielectric barrier discharge (DBD). A reduction in plasticizer leaching higher than 80% is achieved with these coatings. The effect of the monomer flow rate, discharge power, and oxygen flow rate on the barrier efficiency is investigated. The coating composition of the best barrier coating has been identified and the long‐time barrier efficiency in contact with an organic solvent has been studied.

show abstract

“…Plasma polymer films were deposited at constant plasma conditions with varying deposition time on PDMS and silicon substrates to derive the substrate-specific deposition rate ( Figure S1). The deposition time was adjusted to obtain a 2 nm thin nanolayer on all PDMS species of different stiffness, which was confirmed by ellipsometry analysis (Table 1) based on the different refractive indices of plasma coated HMDSO layers and PDMS substrates 34,35 . The chemical composition of the coated PDMS samples was analysed by XPS.…”

mentioning

confidence: 89%