2004
DOI: 10.1016/j.tsf.2004.04.036
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Optical properties of ZnTe films prepared by molecular beam epitaxy

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Cited by 31 publications
(7 citation statements)
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“…Among them are molecular beam epitaxy (MBE) [2][3][4][5], metalorganic vapour phase epitaxy (MOVPE) [6,7], RF magnetron sputtering [8], electrochemical etching [9]. Nevertheless, among these various technologies the Pulsed Laser Deposition (PLD) method is a highly flexible thin-film growth technique, which has been successfully applied to a wide range of materials [10].…”
Section: Introductionmentioning
confidence: 99%
“…Among them are molecular beam epitaxy (MBE) [2][3][4][5], metalorganic vapour phase epitaxy (MOVPE) [6,7], RF magnetron sputtering [8], electrochemical etching [9]. Nevertheless, among these various technologies the Pulsed Laser Deposition (PLD) method is a highly flexible thin-film growth technique, which has been successfully applied to a wide range of materials [10].…”
Section: Introductionmentioning
confidence: 99%
“…Several techniques have been developed for the fabrication of ZnTe semiconductor, such as molecular beam epitaxy (MBE) [8], ionized cluster beam (ICB) [9], electrodeposition [10] and metal organic chemical vapor deposition (MOCVD) [11]. Among these techniques, electrodeposition is recognized as an attractive technique to synthesize semiconductors, because it offers many advantages, including low-temperature processing, cost-effectiveness and high degree of freedom in altering the interplay between the crystal growth rate and the mass transport rate [12].…”
Section: Introductionmentioning
confidence: 99%
“…with the rms values of the heights equal to several tens or hundreds nanometers) with a wide interval of spatial frequencies [1][2][3][4][5][6]. In this case it is not possible to use simple models of this roughness employed within the known theories of the interaction of light with rough surfaces that have been utilized so far (e.g.…”
Section: Introductionmentioning
confidence: 99%