Optical Recording Using High Numerical-Aperture Microlens by Plasma Etching

Kouchiyama, A.; Ichimura, Isao; Kishima, Koichiro; Nakao, Takashi; Yamamoto, Kenji; Hashimoto, Gakuji; Iida, Atsushi; Osato, Kiyoshi

doi:10.1143/jjap.40.1792

Cited by 14 publications

(4 citation statements)

References 2 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The process requires the selectivity of the fused quartz over photoresist to be almost unity. The etch rate obtained in an NLD plasma generated with a gas mixture of C 2 F 6 /C 3 F 8 /O 2 at 0.27 Pa was, for example, 900 nm min −1 [27]. Similar arrays of microcones were also fabricated with fused silica in NLD RIE processes based on a gas mixture of C 4 F 8 /CH 2 F 2 /O 2 at the total pressure of 0.5 Pa [28].…”

Section: Sio 2 Etching For Mems Applicationsmentioning

confidence: 95%

Magnetic neutral loop discharge (NLD) plasmas for surface processing

Uchida¹,

Hamaguchi

2008

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

A neutral loop discharge (NLD) is a plasma generated along a magnetic neutral (i.e. null field) loop at magnetic cusps by an externally applied radio frequency (RF) electric field. Due to partial electron cyclotron resonance and good electron confinement by the magnetic cusps, the NLD plasma can efficiently absorb power from the RF field. For applications to material surface processing, NLD plasmas have two important advantages. One is the high ionization rates, which allow the production of high-density plasmas with relatively low electron temperatures at low gas pressures. The other is the spatial and temporal controllability of magnetic field configuration, which allows optimization of plasma configuration during processing. For example, highly uniform plasma processing over a large wafer can be achieved with time-varying shape control of an NLD plasma. In this paper, some basic properties of NLD plasmas as well as several examples of their applications to plasma processing are reviewed. It is shown that, due to their high plasma densities and low collisionality, NLD plasmas are especially suited for highly anisotropic high-throughput etching processes such as those for fabrication of micro-electromechanical systems/nano-electromechanical systems.

show abstract

Section: Sio 2 Etching For Mems Applicationsmentioning

confidence: 95%

Magnetic neutral loop discharge (NLD) plasmas for surface processing

Uchida¹,

Hamaguchi

2008

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

show abstract

“…A microlens is generally fabricated by various techniques such as wet plasma processing, focused ion beam (FIB) technology, wet etching and laser lithography. (18)(19)(20)(21) However, the profile of a microlens fabricated by these techniques is affected by factors such as etching resistance and reflow shape of the resist. To improve the reproducibility of the microlens profile, we examined the microlens fabrication process using vertical mesa structures formed on a quartz substrate.…”

Section: Prospect Of Combination With Optical Devices and Single-cellmentioning

confidence: 99%

Single-Cell Isolation and Size Sieving Using Microenclosure Array for Microbial Analysis

2015

Sensors and Materials

View full text Add to dashboard Cite

We demonstrated a size sieving microbial cell separation apparatus consisting of multipillar microenclosures. The apparatus consists of two kinds of microenclosures that differ in size, namely, 4 × 4 μm 2 enclosures with 0.2 μm space between 1 μm diameter pillars and 8 × 8 μm 2 enclosures with 1 μm space. Single cells of Escherichia coli and Saccharomyces cerevisiae were separately captured in smaller and larger microenclosures, respectively, just by dropping mixtures. Moreover, we examined whether incubation using the microenclosure structure was possible or not, and succeeded in the incubation of S. cerevisiae. Microlens arrays using prefabricated mesa structures by the Ar plasma etching process were also manufactured. We believe that the fluorescence analysis or investigation of photochemical reactions for microbial single cells can be carried out by a combination of the microenclosure structure and optical devices.

show abstract

“…More specifics on the aspherical microlens fabrication have been reported by Kouchiyama et al who used magnetic neutral loop discharge (NLD) plasma etching. 17) The integrated array is realized after bonding the microlens 1 : 1 is suitable for the pattern transfer from the photoresist microlens to the semiconductor substrate, thus a spherical microlens of 2 µm height is required for our research (see Fig. Fig.…”

Section: Integrated Vcsel Microprobe Array With the Microlens Designmentioning

confidence: 99%

Microoptical Two-Dimensional Devices for the Optical Memory Head of an Ultrahigh Data Transfer Rate and Density Sytem Using a Vertical Cavity Surface Emitting Laser (VCSEL) Array

Goto

Kim²,

Mitsugi

et al. 2002

Jpn. J. Appl. Phys.

View full text Add to dashboard Cite

The parallel optical memory system has important advantages for realizing both a fast data transfer rate and high memory capacity since it is based on multibeam recording and a smaller spot size using the vertical cavity surface emitting laser (VCSEL) and a nanoprobe array. The concept, theoretical analysis and fabrication process for the integrated VCSEL nanoprobe array head are discussed with emphasis on the micro-optical issues such as the improvement of optical efficiency by microlens focusing. The flat-tip nanoprobe structure was successfully prepared with the small metal aperture of 150 nm and 1.25% optical throughput using metal aperture Si or GaP semiconductor nano-probes. To realize better optical throughput in the integrated VCSEL, a special nanoprobe array and a microlens array were developed. The microlens array was prepared using a thermal reflow process of the photoresist and lens shape pattern transfering to the semiconductor nanoprobe bottom face by dry etching. Since this two-dimensional array system requires three-dimensional micro-optical adjustment to focus a very small spot on the recording media, this research can provide guidelines for new micro-optical components in future technology.

show abstract

Optical Recording Using High Numerical-Aperture Microlens by Plasma Etching

Abstract: We propose the use of a high numerical-aperture (NA) microlens formed by plasma etching for an optical recording application. It was found through optical recording experiments that a microlens formed by plasma etching is applicable to a tiny objective lens.

Cited by 14 publications

References 2 publications

Magnetic neutral loop discharge (NLD) plasmas for surface processing

Magnetic neutral loop discharge (NLD) plasmas for surface processing

Single-Cell Isolation and Size Sieving Using Microenclosure Array for Microbial Analysis

Microoptical Two-Dimensional Devices for the Optical Memory Head of an Ultrahigh Data Transfer Rate and Density Sytem Using a Vertical Cavity Surface Emitting Laser (VCSEL) Array

Contact Info

Product

Resources

About