Optimal conditions for controllable one-dimensional nanomold by selective etching of multilayer film

Selective, template-assisted growth of electrodeposited, layered materials leads to the top-down designable realization of nanopatterned surfaces with a large surface area (>1 cm(2)) comprised of multi-dimensional, multiscale (10 nm-1 μm) features, without the need of standard nanolithography. This process opens a manufacturable route to functional nanodevices that rely on anisotropic, nanoscale surface structures with controlled dimensions.

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Nanopatterned Surfaces Based on Template‐Assisted Multilayer Electrodeposition

Kim

Allen

2014

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Optimal conditions for controllable one-dimensional nanomold by selective etching of multilayer film

Cited by 1 publication

References 7 publications

Nanopatterned Surfaces Based on Template‐Assisted Multilayer Electrodeposition

Nanopatterned Surfaces Based on Template‐Assisted Multilayer Electrodeposition

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