2018
DOI: 10.1088/1742-6596/1123/1/012046
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Optimization of 10nm Bi-GFET Device for higher ION/IOFF ratio using Taguchi Method

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Cited by 4 publications
(1 citation statement)
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“…In addition, the numerical simulation could be combined with numerous statistical and machine learning approaches in identifying the optimal solution for better output performances [13,14,15]. The main advantage of these approaches is to provide predictive insight on the device performances before undergoing actual experimental and fabrication process which definitely saving a lot of time and cost [16,17,18].…”
Section: Introductionmentioning
confidence: 99%
“…In addition, the numerical simulation could be combined with numerous statistical and machine learning approaches in identifying the optimal solution for better output performances [13,14,15]. The main advantage of these approaches is to provide predictive insight on the device performances before undergoing actual experimental and fabrication process which definitely saving a lot of time and cost [16,17,18].…”
Section: Introductionmentioning
confidence: 99%