Optimization of polishing path and material removal for uniform material removal in optical surface polishing

Qu, Xingtian; Liu, Qinglong; Wang, Hongyi; Liu, Haizhong; Liu, Jiming; Sun, Haiming

doi:10.1007/s00170-022-10464-0

Cited by 5 publications

(2 citation statements)

References 25 publications

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“…Optical polishing processes are typically classified into two types: sub-aperture polishing processes that use a small tool to scan the optic surface [1] , and full-aperture continuous polishing processes that use a lap substantially larger than the optical elements being polished [2] . The full-aperture continuous polishing machine consists of an annular pitch layer prepared on a substrate platen as the polishing lap, as shown in Fig.…”

Section: Introductionmentioning

confidence: 99%

Formation and changing principle of the dynamic shape of the pitch polishing lap under the loading conditioner in continuous polishing

Liao,

Xie,

Zhang

et al. 2024

Preprint

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Full-aperture continuous polishing is one of the key processes for polishing large flat optical elements. The surface figure of the optics polished by continuous polishing depends largely on the pitch polishing lap’s surface shape, which is controlled by a large conditioner. The changing process of the surface shape of the viscoelastic pitch lap under the loading conditioner is extremely complicated and has not been fully understood. This paper focuses on the formation mechanism and changing principle of the dynamic shape of the pitch lap during polishing. Firstly, the viscoelastic properties of the pitch lap are analyzed, and a viscoelastic creep model of the pitch lap is established. Then, the dynamic change process of the surface shape of the pitch lap under the loading pressure of the conditioner is explored, and a solution model of the dynamic shape of the pitch lap at the polishing station is established. Finally, polishing experiments were conducted to verify the model. This paper for the first time reveals that the surface shape of the pitch lap presents a dynamic change, which lays a foundation for controlling the surface shape of the pitch lap.

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Section: Introductionmentioning

confidence: 99%

Formation and changing principle of the dynamic shape of the pitch polishing lap under the loading conditioner in continuous polishing

Liao,

Xie,

Zhang

et al. 2024

Preprint

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show abstract

“…For instance, Qu, X. [18] implemented scanning paths and employed numerical methods to determine the optimal spacing value of the polishing paths. They controlled the removal depth by optimizing the feed rate, thus mitigating over-polishing in the edge area.…”

Section: Introductionmentioning

confidence: 99%

Study of Modified Offset Trajectory for Bonnet Polishing Based on Lifting Bonnet Method

Sha,

Ma,

Han

et al. 2023

Micromachines

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The inability to converge at the edge of a workpiece during polishing affects the edge profile accuracy and surface quality of the workpiece. In this study, a bias trajectory generation method based on the lifting bonnet method that can maintain the morphology of polished edges is presented. Firstly, by establishing the polishing parameters and the decreasing rule in line with the principles of the lifting bonnet method, we obtained the residual height spacing, the radius of the polishing area, the centre offset position, and the pressing depth for each offset trajectory. Subsequently, the modified bias trajectory algorithm correction coefficients were obtained by fitting the edge trajectories using cubic Bessel curves, which were multiplied with the bias amount to obtain the final modified bias trajectory. Finally, an experiment was designed to compare the edge effect of the modified bias trajectory with the traditional grating trajectory. The experimental findings indicate that the reduction in edge collapse following the implementation of the modified offset trajectory was 1.30 μm. In contrast, the edge collapse after polishing with the traditional grating trajectory amounted to 98.67 μm. Moreover, the edge collapse ensuing traditional polishing trajectory was 75.9 times more pronounced than that observed after using the modified offset trajectory. It is shown that the modified bias trajectory method can not only maintain the original edge morphology of the workpiece but can also promote the convergence of the edge effect to a certain extent.

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A Layered Split Polishing Path Planning Method Used in AWJP Based on Optical Glass Surface Morphology

Chen,

Yu,

Pan

et al. 2024

Int. J. Precis. Eng. Manuf.

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Optimization of polishing path and material removal for uniform material removal in optical surface polishing

Cited by 5 publications

References 25 publications

Formation and changing principle of the dynamic shape of the pitch polishing lap under the loading conditioner in continuous polishing

Formation and changing principle of the dynamic shape of the pitch polishing lap under the loading conditioner in continuous polishing

Study of Modified Offset Trajectory for Bonnet Polishing Based on Lifting Bonnet Method

A Layered Split Polishing Path Planning Method Used in AWJP Based on Optical Glass Surface Morphology

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