2020
DOI: 10.1063/1.5140464
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Optimization of ruthenium as a buffer layer for non-collinear antiferromagnetic Mn3X films

Abstract: Two thin film deposition routes were studied for the growth of high quality single crystalline Ru (0001) epitaxial films on c-Al2O3 substrates using RF-magnetron sputtering. Such films are very important as buffer layers for the deposition of epitaxial non-collinear antiferromagnetic Mn3X films. The first route involved depositing Ru at 700 °C, leading to a smooth 30 nm thick film. Although, high resolution X-ray diffraction (HRXRD) revealed twinned Ru film orientations, the in-situ post-annealing eliminated o… Show more

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Cited by 7 publications
(2 citation statements)
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“…The location of the peaks indicates that the epitaxial film is formed with a relationship of Mn 3 Sn (0001)[202¯$\bar{2}$0] || Ru (0001)[101¯$\bar{1}$0] || Al 2 O 3 (0001)[112¯$\bar{2}$0], which is similar to the work by S. Kurdi, et al. [ 26 ]…”
Section: Resultssupporting
confidence: 83%
See 1 more Smart Citation
“…The location of the peaks indicates that the epitaxial film is formed with a relationship of Mn 3 Sn (0001)[202¯$\bar{2}$0] || Ru (0001)[101¯$\bar{1}$0] || Al 2 O 3 (0001)[112¯$\bar{2}$0], which is similar to the work by S. Kurdi, et al. [ 26 ]…”
Section: Resultssupporting
confidence: 83%
“…Similar XRD pattern was recorded in lower thickness of Mn 3 Sn films (see Figure 1e). To determine the epitaxial relationship, we performed 𝜑-scans for the peaks: [11 20], which is similar to the work by S. Kurdi, et al [26] In order to determine the composition and its distribution, we used an electron probe microanalyzer (EPMA) and energy dispersive X-ray (EDX) mapping on our samples. The composition of the film is estimated to be Mn 3.14±0.03 Sn 0.86±0.01 using EDX mapping and Mn 3.12±0.02 Sn 0.88±0.01 by quantitative analysis using EPMA system.…”
Section: Resultsmentioning
confidence: 99%