Optimization of Ta_2O_5 optical thin film deposited by radio frequency magnetron sputtering

Abstract

Radio frequency magnetron sputtering has been used here to find the parameters at which to deposit Ta₂O₅ optical thin films with negligible absorption in the visible spectrum. The design of experiment methodology was employed to minimize the number of experiments needed to find the optimal results. Two independent approaches were used to determine the index of refraction n and k values.

Fabrication of multi-wavelength visible and infrared filter for solar atmosphere tomographic imaging

“…Among the available oxide materials, including SiO 2 , Al 2 O 3 , MgO, Sc 2 O 3 , Y 2 O 3 , ZrO 2 , HfO 2 , ZnO, and Ta 2 O 5 , SiO 2 and Ta 2 O 5 have been commonly used as the low-and high-index materials [3][4][5][6][7][8][9][10][11] . In the past, plenty of investigations on optical and micro-structural properties of coatings combined with these two oxide materials have been implemented by various deposition techniques, such as ion beam sputtering [3] , plasma ion-assisted deposition (PIAD) [8] , magnetron sputtering [9] , etc. In view of the particle/defect level, film stress, and manufacturing cost, PIAD is still the preferred technology for the deposition of oxide thin films with high optical performance and excellent environmental durability.…”