Optimization of thin-film design for multi-layer dielectric grating

Liu, Shijie; Ma, Jun; Shen, Zicai; Jin, Yufeng; Shao, Jianda; Fan, Zhengxiu

doi:10.1016/j.apsusc.2006.07.071

Cited by 12 publications

(9 citation statements)

References 15 publications

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“…Two kinds of grating support mirrors are studied: the MLD mirror and the MMLD mirror. Both designs are engineered to cope with various specifications [21,22]. In peculiar, the mirror shall exhibit a high reflectivity for (0) th and the (−1) th order of the 1780l/mm grating [19], thus being centered at the median angle of these two angles.…”

Section: Stack Designmentioning

confidence: 99%

High reflection mirrors for pulse compression gratings

Palmier¹,

Néauport²,

Baclet³

et al. 2009

Opt. Express

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We report an experimental investigation of high reflection mirrors used to fabricate gratings for pulse compression application at the wavelength of 1.053microm. Two kinds of mirrors are studied: the mixed Metal MultiLayer Dielectric (MMLD) mirrors which combine a gold metal layer with some e-beam evaporated dielectric bilayers on the top and the standard e-beam evaporated MultiLayer Dielectric (MLD) mirrors. Various samples were manufactured, damage tested at a pulse duration of 500fs. Damage sites were subsequently observed by means of Nomarski microscopy and white light interferometer microscopy. The comparison of the results evidences that if MMLD design can offer damage performances rather similar to MLD design, it also exhibits lower stresses; being thus an optimal mirror substrate for a pulse compression grating operating under vacuum.

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Section: Stack Designmentioning

confidence: 99%

High reflection mirrors for pulse compression gratings

Palmier¹,

Néauport²,

Baclet³

et al. 2009

Opt. Express

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“…In high-energy laser systems, multi-layer dielectric gratings (MDGs) have been widely used owing to their high diffraction efficiency and high damage resistant ability [8]. The multi-layer dielectric gratings can be obtained by etching a grating structure on the top of a multi-layer dielectric thin film.…”

Section: Numerical Calculationmentioning

confidence: 99%

Rigorous coupled-wave analysis for the optical character of multi-layer dielectric thin film

et al. 2008

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The optical property of multi-layer dielectric thin film is determined by its operation on the more or less complete cancellation of the light reflected at the upper and lower of the multi-layer interface of the thin film. An enhanced, numerically stable transmittance matrix approach based on rigorous coupled-wave analysis (RCWA) is applied to the analysis of optical character for multi-layer dielectric thin film. A design of a thin film stack used in multi-lay dielectric grating was presented by using the method of RCWA. The numerical calculation shows that RCWA is a relatively straightforward and deterministic technique for analysis the optical property of multi-layer dielectric thin film.

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“…Because of the superior properties such as thermal stability, relatively wide bandgap energy, and transparent spectral range from the infrared to the ultraviolet, HfO 2 is one of the most important high refractive index thin film materials [5][6][7][8]. It can also be used in electronic and optoelectronic devices [9,10].…”

Section: Introductionmentioning

confidence: 99%