2022
DOI: 10.1039/d2ra06255k
|View full text |Cite
|
Sign up to set email alerts
|

Optimized study of the annealing effect on the electrical and structural properties of HDLC thin-films

Abstract: The plasma-enhanced chemical vapor deposition (PECVD) technique has been utilized for the facile surface deposition of hydrogenated diamond-like carbon (HDLC) thin-films onto Si(100) substrates.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Year Published

2024
2024
2024
2024

Publication Types

Select...
1

Relationship

0
1

Authors

Journals

citations
Cited by 1 publication
references
References 31 publications
0
0
0
Order By: Relevance