“…It is evident that the improvement of the material properties can be reached by the optimization of the preparation conditions. NiO films can be fabricated by different physical and chemical vapour deposition techniques and numerous attempts including sputtering [10,11], plasma-enhanced chemical vapour deposition [12], pulsed laser deposition [13], electrochemical deposition [14,15], sol-gel [16], and spray pyrolysis [17] have been used in the preparation NiO thin films. Among these methods, reactive sputtering is considered to be most widely useful technique having high deposition rates, uniformity over large areas of the substrates and easy control over the composition of the deposited films.…”