Ordered arrays of highly oriented single-crystal semiconductor nanoparticles on silicon substrates

Abstract

One of the unsolved problems in the application of nanoparticle arrays is how to precisely control their macroscopic properties based on the microscopic properties of their basic component-the individual nanoparticle. Thus it is highly desirable to fabricate arrays of perfect iso-nanoparticles, which are defined as particles of the same size, structure, and ambient condition. Here we show that ordered semiconductor (indium oxide) single-crystal nanoparticle arrays can be obtained by oxidation of arrayed metal (indium) nanoparticles. The arrayed semiconductor nanoparticles have similar size, shape, crystalline structure and orientation, and ambient condition. Our work is a step closer towards the goal of achieving iso-nanoparticle arrays.

A closer look at the synthesis and formation mechanism of hematite nanocubes

“…An important observation made was that these particles were found to be polycrystalline. The polycrystalline nature of the pseudocubes was related to the fact that nucleation of hematite occurs at the akaganeite interface, and a model for the formation mechanism was developed based on Debye-Huckel theory [25].Given the importance of single crystal nanoparticles for various applications and the fact that the characterization of typical materials properties is generally easier for single crystal particles [26][27][28][29], we thus started an investigation of the formation hematite particles at low FeCl 3 concentrations (0.01-0.1 M). Moreover, in our attempt to achieve full control over the nanostructure of hematite particles we extended this study also to an investigation of the influence of the size and concentration of the metastable akaganeite precursor particles on the crystallinity and size of the final hematite particles.…”

Mössbauer spectroscopy and magnetization of ordered arrays of ultrathin FePt nanodisks with perpendicular magnetisation

“…The pore size can be varied in the range from 15 to 200 nm including the inter-pore distance which can be tuned similarly. The details for the preparation of ultrathin Al 2 O 3 masks with a high degree of order and narrow pore size distribution (σ ≈ 15%) can be found elsewhere [14][15][16]. To prepare nanodisk samples, MgO(100) substrates were ex-situ covered with the UTAMs and outgassed in vacuum for two days at a temperature of 350 • C at a pressure of 2 × 10 −9 mbar which was also the base-pressure during the evaporation process.…”

Ordered Arrays of Nanostructures and Applications in High‐Efficient Nano‐Generators

“…[6,[18][19][20][21][22][23][24][25][26][27][28][29][30][31][32] The structural parameters of the anodic alumina membranes, such as the pore diameter and spacing, can be tuned in the range of about 10-200 and 25-420 nm, respectively. Accordingly, the size and spacing of the above-mentioned three classes of nanostructures that are prepared using the alumina membranes can be adjusted in the similar size range.…”

“…Recently, using ultra-thin alumina membranes (UTAMs) as evaporation or etching masks, [6] large-scale arrays of ordered nanostructures can be fabricated on substrates, including ordered nanodot [18][19][20][21][22][23][24][25][26][27] and nanohole arrays. [28][29][30][31][32] The UTAM is a through-hole alumina membrane with small thickness of about several hundred nanometers.…”

“…[7][8][9][10][11][12][13][14] Using a two-step replication process, metallic and semiconductor nano-porous membranes can be prepared using the alumina membranes as the original. [5,[15][16][17] Moreover, recent research concerning a surface nano-patterning technique [6,[18][19][20][21][22][23][24][25][26][27][28][29][30][31][32] using ultra-thin alumina membranes (UTAMs) has successfully fabricated ordered arrays of surface zero-dimensional nanostructures including nanodots and nanoholes.…”