Mechanical flexibility, optical clarity, light weight, and low production cost are highly desirable thin-film transistor (TFT) characteristics. Hence, scalable/benign large-area fabrication processes for such devices are the object of rapidly growing interest with the ultimate goal of producing switching devices for portable, "invisible" electronics. [1][2][3][4] Since the first entirely transparent TFT was reported in 2003, [5] extensive academic and industrial efforts have focused on enhancing the operating performance of such devices. [6][7][8][9][10][11][12] This has included sustained efforts to achieve transparent TFT flexibility or bendability on plastic substrates [3,[13][14][15][16] recognizing: (1) the low maximum working temperatures (T g : 80-150°C) and high thermal expansion coefficients of typical low-cost, optically clear plastics; (2) the limited high-quality transparent semiconductor and dielectric candidate materials which can be grown at low temperatures; (3) the lack of appropriate lowtemperature thin-film fabrication technologies to deposit such materials. Therefore, the development of optimum TFT component materials and low-temperature device fabrication processes is of high priority. In this contribution, we report a new class of inorganic/organic hybrid TFTs which are first fabricated and optimized on doped silicon gates/substrates, and then incorporated into transparent, flexible TFTs on PET substrates. These devices have good visible transparency, mechanical flexibility, and current modulation characteristics. Note that the entire TFT fabrication process is carried out near room temperature and is scalable, thus providing an attractive pathway for future large-area plastic electronics. Essential parameters describing TFT device performance are the field-effect mobility (l FE ), I on /I off modulation ratio, threshold voltage (V T ), subthreshold voltage swing (S), and operating voltage. [17,18] For TFT applications such as switching devices, a sharp step-like current-voltage response is desired.In practical TFTs, the off-state current (I off ) flowing through the device when V GS < V T (V GS is the bias applied between gate and source electrodes) must be minimal; on the other hand, the on-state current (I on ) is intrinsically limited by the channel mobility and must be maximized to realize optimum current modulation. Modulation/switching occurs within the range of applied V GS when V DS (applied bias between the drain and source electrodes) is fixed at a certain value, and is characterized by the subthreshold voltage swing. Thus, efficient TFT response demands large field-effect mobilities in the semiconducting channel layer and excellent electrical insulating properties in the proximate dielectric layer. In addition, for transparent and flexible TFTs, optical transparency of the materials set and compatibility with mechanically compliant plastics must be achieved. Among potential semiconductor candidates for transparent and flexible TFTs, metal oxide semiconductors are arguably some of...