“…ESD was first introduced as a fabrication method of thin radioactive source in nuclear research in 1950s, [16][17][18][19] and was then used in various processes: sample preparation in mass spectrometry, [20,21] modification of silicon surfaces, [22] semi-conductive ceramics, [23] polymer coatings, [24] DNA and protein films for scanning tunnelling microscopy, [25,26] and functionally and biologically active protein deposition. [27][28][29][30] The authors have also studied deposition/patterning methods using electrically charged nanoparticles generated by electrospray [31][32][33] and surface acoustic wave (SAW) atomizer. [34][35][36] The advantages of these methods are that they are performed under atmospheric pressure and room temperature, which may lead to low equipment cost.…”