Block copolymer (BCP) films with vertically aligned lamellar
structures
hold great application potential in multiple fields. Nevertheless,
systematic control of the lamellar morphology in BCP films has rarely
been reported so far, including connectivity, etch selectivity, and
orientation. Here, we report an effective approach to construct perpendicularly
oriented lamellar domains by incorporating the azobenzene groups into
the side chains of polystyrene-block-polymethacrylate
(PS-b-PMMA) with different flexible spacers (x), namely, PS-b-PMA(xC)Az (x = 0, 6, or 11). Two- and three-dimensional
vertical lamellae, such as thick high-connectivity lamellae, thin
defect-free lamellae, and mixture lamellae, can be fabricated by manipulating x. Simultaneously, the perpendicular lamellae with different
morphologies can be obtained on various substrates, such as hard silicon
wafers, flexible aluminum sheets, and transparent polyethylene terephthalate
(PET) films. Herein, a plausible mechanism is demonstrated. The present
strategy might open an avenue to engineer the morphology of perpendicularly
aligned lamellar films for applications that either require high-connectivity
percolating transport or defect-free lithography templates.