“…Low-power plasmas can induce the polymerization of a precursor gas on the substrate surface and introduce functional groups under specific plasma conditions (Hulleman, Kalisvaart, Janssen, Feil, & Vliegenthart, 1999;Jenkins & Donald, 1998;Santos, Bastos, Silva, Thiré, & Simão, 2012;Vaydia, Bhattacharya, & Zhang, 1995). Two successful methods that have been reported in the literature for inducing surface hydrophobization are the use of chemical vapor deposition -CVD plasma -either with sulfur hexafluoride (SF 6 ) or with hexamethyldisiloxane (HMDSO) as precursor gases (Andrade, Simão, Thiré, & Achete, 2005;Bastos, Santos, Silva, & Simão, 2009;Cruz-Barba, Manolache, & Denes, 2002;Hegemann, Brunner, & Oehr, 2001;Hulleman et al, 1999;Jenkins & Donald, 1998;Santos et al, 2012;Selli, Mazzone, et al, 2001;Selli, Riccardi, Massafra, & Marcandalli, 2001;Simão, da Silva, Martins, Thiré, & Andrade, 2007;Vaydia et al, 1995;Zanini, Massini, Mietta, Grimoldi, & Riccardi, 2008). SF 6 plasma is used to introduce fluoride on treated surfaces resulting in contact angles greater than 130 • due to fluoride incorporation together with surface reticulation (Bastos et al, 2009).…”