2014
DOI: 10.1103/physrevb.89.115202
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Origins of hole traps in hydrogenated nanocrystalline and amorphous silicon revealed through machine learning

Abstract: Genetic programming is used to identify the structural features most strongly associated with hole traps in hydrogenated nanocrystalline silicon with very low crystalline volume fraction. The genetic programming algorithm reveals that hole traps are most strongly associated with local structures within the amorphous region in which a single hydrogen atom is bound to two silicon atoms (bridge bonds), near fivefold coordinated silicon (floating bonds), or where there is a particularly dense cluster of many silic… Show more

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Cited by 38 publications
(40 citation statements)
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“…Furthermore, the CS analysis sets forth that the NSP is surely violated already for W = 2 if any two columns of D are a multiple of each other. In general, one can expect the solution of equation (8) to differ significantly from the solution of equation (7) if any two columns of D are highly correlated or, in general, if any of the columns of D lies close to the span of a small number of any other its columns.…”
Section: N Cmentioning
confidence: 99%
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“…Furthermore, the CS analysis sets forth that the NSP is surely violated already for W = 2 if any two columns of D are a multiple of each other. In general, one can expect the solution of equation (8) to differ significantly from the solution of equation (7) if any two columns of D are highly correlated or, in general, if any of the columns of D lies close to the span of a small number of any other its columns.…”
Section: N Cmentioning
confidence: 99%
“…The reason for the large coefficients for the former is that considering the 82-dimensional vectors whose components are the values of ( ) r B s and ( ) r B p for all the materials (in the same order), these vectors are almost parallel (their Pearson correlation coefficient is 0.996). 7  In order to understand this, let us have a look at both least square models: to be correlated to r p . This is true for all the atoms considered in this work, but it could well be that such strong correlation is not valid for all atoms.…”
Section: A Simple Lasso Example: the Energy Differences Of Crystal Stmentioning
confidence: 99%
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“…We see that in both hydrogen content ensembles the application of stress reduces the incidence of moderately high HTD ID defects (HTD > 0.1 eV), but also that decreasing the hydrogen in the samples causes the expression of fewer IDs. We believe that this is due to the less-constrained Si-H bonds (hydrogen is usually bonded to only one, or at most two silicon atoms [34]) allowing a higher degree of bond rearrangement under the added potential of a hole being introduced into the system, and thus allowing stronger hole trapping. In the tensile stress regime, it is interesting to note that the decrease in occurrence of IDs and FBs does not explain the overall increased tails in the full hole trap distributions (seen in the generally higher values in the positive stress columns of Fig.…”
Section: Ionization Displacement Defectsmentioning
confidence: 99%