2013
DOI: 10.1103/physrevlett.110.085501
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Overcoming the Phase Inhomogeneity in Chemically Functionalized Graphene: The Case of Graphene Oxides

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Cited by 52 publications
(51 citation statements)
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“…The kinetics of agglomeration is governed by diffusion processes, and in case of isolated epoxide and hydroxyl groups on graphene, their diffusion rates are controlled by migration energies of 0.8 eV and 0.5 eV, respectively (ESI). A number of DFT studies have addressed the diffusion and interaction of epoxide and hydroxyl species on graphene, and the results thus far discussed are in agreement with these recent computational works2537394042475253545556. Here, we address in detail the effects played by agglomeration phenomena onto the chemical stability and structure of GO.…”
Section: Resultssupporting
confidence: 79%
“…The kinetics of agglomeration is governed by diffusion processes, and in case of isolated epoxide and hydroxyl groups on graphene, their diffusion rates are controlled by migration energies of 0.8 eV and 0.5 eV, respectively (ESI). A number of DFT studies have addressed the diffusion and interaction of epoxide and hydroxyl species on graphene, and the results thus far discussed are in agreement with these recent computational works2537394042475253545556. Here, we address in detail the effects played by agglomeration phenomena onto the chemical stability and structure of GO.…”
Section: Resultssupporting
confidence: 79%
“…In the former, the oxygen functionalities are randomly distributed across the graphene plane, while in the latter, the oxygen groups diffuse and form distinct clusters. Although we know that such a process is energetically favorable from our previous work 31,40 and other literature, 35,41,42 what exactly happens to the surface chemistry upon clustering, i.e. , changes in the relative concentration of oxygen functional groups, remains unknown to date.…”
Section: Resultsmentioning
confidence: 94%
“…The ease with which graphene can be functionalized with hydrogen [3][4][5], oxygen [6][7][8], and metal atoms [9][10][11] has further added a new dimension into its potential for novel applications. Atomic layer deposition (ALD) is an efficient surface controlled thin film growth technique that is often used to deposit metal atoms on graphene [12].…”
Section: Introductionmentioning
confidence: 99%