Thin films of
ZnGa2O4:normalMn
films have been deposited by radio frequency magnetron sputtering in order to study the effects of annealing temperatures less than 1000°C on the thin-film electroluminescent properties. Energy-dispersive X-ray compositional analysis showed a loss of zinc during sputtering, with the film composition being
Zn0.9Mn0.03Ga2O4.
All films showed strong (111) and (222) X-ray reflections relative to the power standard. As the annealing temperature was raised, the texture rotated toward that of the powder material. The as-deposited films showed no photoluminescence; however, once annealed at
T⩾750°C,
a single emission band at 504 nm was observed. Emission wavelength was independent of annealing temperature. The electroluminescent brightness of the devices peaked at an annealing temperature of 900°C. Peak brightness and efficiency were 350
normalcd/m2
and 0.55 lm/W at 60 Hz, and 1500
normalcd/m2
and 0.30 lm/W at 600 Hz. These high brightness values have been attributed to the roughness of the substrates. © 2001 The Electrochemical Society. All rights reserved.