Proceedings of the Fourth Asian Symposium on Information Display 1997
DOI: 10.1109/asid.1997.631403
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Oxide Phosphors For Full-color Tfel Display

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Cited by 5 publications
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“…It should also be noted that the Mn doping level remains to be optimized in these films, which should further enhance their performance. In PL phosphors, the optimum doping level has been determined to lie in the range of 0.5-0.6%, 16,29 depending on the stoichiometry, while the optimum level in TFEL devices was determined to be in the range of 1-2% by Minami et al 30 ERD analysis of the films determined the doping level at 3%, vs. 2% in the targets. The brightness-voltage characteristics of these films is shown in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…It should also be noted that the Mn doping level remains to be optimized in these films, which should further enhance their performance. In PL phosphors, the optimum doping level has been determined to lie in the range of 0.5-0.6%, 16,29 depending on the stoichiometry, while the optimum level in TFEL devices was determined to be in the range of 1-2% by Minami et al 30 ERD analysis of the films determined the doping level at 3%, vs. 2% in the targets. The brightness-voltage characteristics of these films is shown in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…Ga 2 O 3 has been previously activated with Mn 2+ [2], Cr 3+ [3] and Eu 3+ [4,5]. Generally, the brightest and most efficient rf sputtered films were amorphous.…”
Section: Introductionmentioning
confidence: 99%
“…8 One of the promising oxide phosphors investigated by several groups is the well-known green emitting Zn 2 SiO 4 :Mn. [8][9][10] In addition, both Duan et al 11 and Minami et al 12 found that substituting Ge for Si lowered the required processing temperature while still yielding good EL characteristics. Therefore in this study, pure Zn 2 GeO 4 :Mn was investigated as a TFEL phosphor using a traditional TFEL structure and a glass substrate.…”
mentioning
confidence: 99%