2000
DOI: 10.5006/1.3280511
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Oxides Formed on Titanium by Polishing, Etching, Anodizing, or Thermal Oxidizing

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Cited by 85 publications
(57 citation statements)
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“…The clear change in slope at 10 V is due to the influence of a change in the dielectric constant of the film as crystallization leads to an increase in ε (ε amorphous ¾ D 4-40, ε anatase ¾ D 48). 7,8 Also supporting the slower crystallization in phosphoric acid is the capacitance behavior C P of the porous layer part Fig. 3.…”
Section: Oxides)mentioning
confidence: 99%
“…The clear change in slope at 10 V is due to the influence of a change in the dielectric constant of the film as crystallization leads to an increase in ε (ε amorphous ¾ D 4-40, ε anatase ¾ D 48). 7,8 Also supporting the slower crystallization in phosphoric acid is the capacitance behavior C P of the porous layer part Fig. 3.…”
Section: Oxides)mentioning
confidence: 99%
“…This process leads to the formation of a conductive porous coating layer of TiO 2 over the entire surface of the titanium film. This film is the preanodized TiO 2 [13][14][15][16][17].…”
Section: Methodsmentioning
confidence: 99%
“…It was demonstrated that titanium and its alloys with their stable titanium dioxide films (in two allotropic forms: rutile and anatase) are most effective for apatite nucleation [18 -20]. Anodic oxidation is a superior method to obtain rough, porous oxide surfaces [21,22] proper to develop the apatite-forming ability.…”
Section: Introductionmentioning
confidence: 99%