Metastable impact electron spectroscopy (MIES), ultraviolet photoelectron spectroscopy (UPS(HeI)) and x-ray photoelectron spectroscopy (XPS) were applied to study the interaction of O 2 , CO and CO 2 with Co films at room temperature. The films were produced on Si(100) surfaces under the in situ control of MIES, UPS and scanning tunnelling microscopy (STM). For O 2 , dissociative adsorption takes place initially and then incorporation of oxygen starts at exposures of ∼5 L. Comparison of the MIES and UPS spectra with those published for CoO shows that near-stoichiometric CoO films can be obtained by co-deposition of Co and O 2 . The CO is adsorbed molecularly up to a maximum coverage of ∼0.6 monolayer, with the C-end pointing towards the surface. The CO 2 adsorption is dissociative, resulting in the formation of Co-CO bonds at the surface. The resulting oxygen atoms are mostly incorporated into the Co layer. For all studied molecules the interaction with Co is similar to that with Ni.