2016
DOI: 10.2298/fuee1604509p
|View full text |Cite
|
Sign up to set email alerts
|

P-channel MOSFET as a sensor and dosimeter of ionizing radiation

Abstract: This paper presents a study of MOSFETs as a sensor and dosimeter of ionizing radiation. The electrical signal used as a dosimetric parameter is the threshold voltage. The functionality of these components is based on radiation-induced ionization in SiO 2 , which results in increase of positive charge trapped in the SiO 2 and interface traps at Si-SiO 2 , leads to change in threshold voltage. The first part of the paper deals with analysis of defect precursors created by ionizing radiation, responsible for crea… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
15
0

Year Published

2017
2017
2020
2020

Publication Types

Select...
4
3

Relationship

0
7

Authors

Journals

citations
Cited by 24 publications
(15 citation statements)
references
References 92 publications
0
15
0
Order By: Relevance
“…The parameter b, which appears in the equation (21), can have the value b = 0 for the source end of the channel and b = 1 for the drain end of the channel (in accordance with the equations (9) and (10)). However, the main problem in modelling of trapped charges with (21) is the fact that the distribution of surface potential in the channel depends not only on gate voltage, but also on drain voltage V DS due to split of quasi Fermi levels [19].…”
Section: Inclusion Of N Ox and D It In Nqs Mos And Nqs Soi Modelsmentioning
confidence: 63%
See 3 more Smart Citations
“…The parameter b, which appears in the equation (21), can have the value b = 0 for the source end of the channel and b = 1 for the drain end of the channel (in accordance with the equations (9) and (10)). However, the main problem in modelling of trapped charges with (21) is the fact that the distribution of surface potential in the channel depends not only on gate voltage, but also on drain voltage V DS due to split of quasi Fermi levels [19].…”
Section: Inclusion Of N Ox and D It In Nqs Mos And Nqs Soi Modelsmentioning
confidence: 63%
“…After the generation of the electron-hole pairs, some of the pairs are immediately recombined. Since the electron mobility in the oxide is considerably bigger that the hole mobility [15,9], the electrons will be soon swept out of the oxide or the dielectrics, while the holes will move slowly through the oxide to the interface SiO 2 -Si, causing long-term effects of the ionizing radiation. Fig.…”
Section: Ionizing Radiation Effects In Cmos Devicesmentioning
confidence: 99%
See 2 more Smart Citations
“…MISFET-based sensors of the total ionizing dose D (TID) have been studied by many investigators [4][5][6][7][8]. Found that radiation sensitivity of sensors depend on electrical modes, structural and technological parameters of MISFET.…”
Section: Introductionmentioning
confidence: 99%